Fabrication and Evaluation of Bragg Gratings on Optimally Designed Silicon-on-Insulator Rib Waveguides Using Electron-Beam Lithography

Wu Zhigang,Zhang Weigang,Wang Zhi,Kai Guiyun,Yuan Shuzhoung,Dong Xiaoyi,Utaka K,Wada Y
DOI: https://doi.org/10.3969/j.issn.1674-4926.2006.08.002
2006-01-01
Chinese Journal of Semiconductors
Abstract:The fabrication of Bragg gratings on silicon-on-insulator (SOI) rib waveguides using electron-beam lithography is presented.The grating waveguide is optimally designed for actual photonic integration.Experimental and theoretical evaluations of the Bragg grating are demonstrated.By thinning the SOI device layer and deeply etching the Bragg grating,a large grating coupling coefficient of 30cm-1 is obtained.
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