Simulation of Combined Environment of Atomic Oxygen and Ultraviolet and Development of Protection Technologies

Jingyu Tong,Xiangpeng Liu,Gang Sun,Lixiang Jiang,Jinhong Li,Shuwang Duo,Meishuan Li
DOI: https://doi.org/10.3969/j.issn.1672-7126.2006.04.002
2006-01-01
Abstract:A combined environment of atomic oxygen and ultraviolet (AO/UV) has been successfully simulated to in-situ characterize spacecraft materials and to develop effective protection technologies. The simulation facility mainly consists of a microwave electron resonance ion source, driven by 1 kW at 2.45 GHz, and two deuterium UV lamps. The 5 eV atomic oxygen beam flux is estimated to be 3 × 10 15 AO/cm 2·s., and the wavelength of the UV irradiation ranges from 115 nm to 400 nm. Possible damages, caused by AO/UV environment, of some typical spacecraft materials, including thermal control paint, TO/kapton and Ge/lcapton films, were simulated, and protective coating of Al 2O 3 was developed.
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