Effects of Boron and Phosphorous on NanoAmorphous NiB and NiP Alloys Studied by Xray Spectroscopy

Shiqiang Wei,Zheng Jiang,Zheng Wei,Xinyi Zhang,Zou Shaobo

DOI: https://doi.org/10.1238/physica.topical.115a00841

2005-01-01

Physica Scripta

Abstract:Both XAFS and XRD techniques have been used to investigate the effects of boron and phosphorous in nano-amorphous Ni-B and Ni-P alloys annealed at various temperatures. The XAFS and XRD results indicate that the initial Ni-B and Ni-P samples are amorphous alloys with large disorder. The static disorder factor (sigma(S)) of the nearest Ni-Ni sub-shell is 0.33 and 0.28 angstrom for the initial Ni-B and Ni-P alloys, respectively. Under an annealing temperature of 573 K, the nano-amorphous Ni-B alloy is crystallized into mixed phases of a crystalline Ni3B and a metastable intermediate with smaller grain size and metallic Ni-like structure whose average grain size is about 30 nm, and the nano-amorphous Ni-P alloy forms two phases of crystalline Ni and Ni3P with an average grain size of about 120 nm. It means that boron can retard the growth of Ni-B alloy into particles with larger size, in comparison with phosphorous. When the annealing temperature is increased to 773 K, most of the nano-crystalline Ni3B is decomposed into crystalline Ni with larger grain size, but crystalline Ni3P is rather stable. The XAFS results further show that the local structure around Ni atoms in the NiB sample annealed at 773 K is almost the same as that of Ni foil. However, the static disorder sigma(S) (0.125 angstrom) of the Ni-P sample annealed at 773 K is still much larger, which is attributed to the existence of some amount of crystalline Ni3P. These results suggest that there is a great difference in the crystallization mechanism between nano-amorphous Ni-B and Ni-P alloys.