Abstract:The lifespan of plasma discharge devices is strongly influenced by the deterioration characteristics of MgO protective layer deposited on the dielectric covering the electrode. In order to attain both lower driving voltage and higher luminous efficiency in these devices, different complex metal oxides protective layers have been extensively studied as alternatives to MgO. However, the interaction between energetic ions and fast neutral atoms with the protective layer can produce serious damages to it and their nearby components. In this paper, we study the ion beam bombardment for several protective layers by low-energy noble gas with various ion incidence angles by using the Monte Carlo simulation. On the basis of the binary collision approximation using SRIM-2013, different parameters are discussed for instance backscattering yield, retained dose, sputtering yield, number of vacancies, and ion range of MgO, (Mg,Ca)O, (Mg,Sr)O, (Mg,Ba)O and (Mg,Ca,Sr)O. From our results, the retained dose, sputtering yield and number of vacancies of complex metal oxide protective layers are lower than that of MgO. Moreover, the backscattering yield increases by increasing the incident angles and it is highest for complex metal oxide protective layers.

Influence of ZrO2 Addition on the Microstructure and Discharge Properties of Mg–Zr–O Protective Layers in Alternating Current Plasma Display Panels

Influence of Oxygen Partial Pressure on Microstructure and Discharge Properties of Mg–Zr–O Protective Films Deposited by Magnetron Sputtering

Effect of Zr Concentration on Microstructure and Discharge Properties of Mg-Zr-O Films Deposited by Magnetron Sputtering

Lowering of the Firing Voltage and Reducing of the Discharge Delay Time in Alternating Current Plasma Display Panels by a Discontinuous Spin-Coated LaB6 Film on the MgO Protective Layer

Electronic Structure Variation During Aging for Mg–Zr–O Protective Films in Alternating Current Plasma Display Panel

Fabrication and characteristics of LaB6-doped MgO protective layer for plasma display panels

Influence of Sc2O3 Doping and Film Growth Conditions on MgO Protective Layers

Study on Structure and Discharge Characteristics of MgO Films in Plasma Display Panel

Influence of Deposition Angle on Performance of MgO Protective Layer

Effect of Aging on Microstructure and Discharging Property of Mg-Zr-O Protective Films for Alternating Current Plasma Display Panel

Surface-discharge Characteristics of Magnesium Oxide Thin Films Prepared by Ion Beam-Assisted Deposition

Preparation and properties of nano ZrO2 coating on magnesium alloy

Improvement of Discharge Properties by Printing ${\rm LaB}_{6}$ Films on MgO Protective Layers in Plasma Display Panel

Structural and Discharging Properties of MgO Thin Films Prepared by Ion Beam-Assisted Deposition

Fabrication and Characteristics of Zn2+ Doped Mgo Films Prepared by Sol-Gel Method

Ion and Neutral Energy Distributions to the MgO Surface and Sputtering Rates in Plasma Display Panel Cells

Advance in the Research of Protective Layer Materials in AC Plasma Display Panels

Effect of Voltage and Duty Cycle on Microstructure and Corrosion Resistance of ZrO2 Coating by Cathode Plasma Electrolytic Deposition

Structure and Properties of Zro2 Ceramic Coatings on Az91d Mg Alloy by Plasma Electrolytic Oxidation

Discharge Characteristics of Protective Lab6 Thin Films in an Ac Plasma Display Panel

Monte Carlo simulations of MgO and complex oxide protective thin layers bombarded with noble-gas ion in plasma discharge devices