Abstract:A carbon arc with a local N2 gas jet is used to deposit a new form of nanocomposite carbon films. The films are comprised of a semiconducting carbon matrix with nanoscale graphitic particles embedded within it. These nanoscale particles have a closed form structure similar to short carbon nanotubes. The field emission properties of these films are reported. A threshold electric field of 3.8 V/μm at 1 nA are measured. After a short wet etch, the measured threshold field reduces to 2.6 V/μm. The emission characteristics of the etched nanocomposite films are very close to those of films made up from randomly oriented nanotubes obtained by drying of a suspension. The unetched nanocomposite films give a more stable emission characteristic. A model which involves emission of electrons from subsurface nanoparticles into the semiconducting a-C matrix, and emission from a-C into vacuum is proposed. This type of film combines the advantages of carbon nanotube field emission with those of plasma based thin film deposition technology. There is a small lowering of the emission current, but the emission stability is greatly improved.

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