Dielectric Property Of Laalo3 Thin Films Doped With Magnetic Co And Co3o4 Clusters

H. Jiang,Hongwei Liu,Huiqiang Yu,Feng Gao,Junming Liu
DOI: https://doi.org/10.1142/S0217979205031511
2005-01-01
International Journal of Modern Physics B
Abstract:sThe thin films of Co-doped and Co3O4-doped dielectric LaAlO3 (LAO) by co-ablation of magnetic metal Co and dielectric LAO on Pt - Ti - SiO2 - Si substrates have been prepared by pulsed laser deposition. A significant enhancement of dielectric constant of LAO upon doping of Co and cobalt oxide clusters is observed. Furthermore, modulation of the dielectric constant of the thin films by applying a magnetic field is verified, obviously due to the ferromagnetism of Co metal and Co oxide clusters embedded in the LAO thin films. A series of microstructural and dielectric characterizations on the as-prepared thin films have been performed and the mechanism underlying the dielectric enhancement upon the doping of Co and Co3O4 clusters is discussed.
What problem does this paper attempt to address?