The Comparison of the Properties of ZnO Thin Films Fabricated by Thermal Oxidation and PLD

Zhaoyang WANG,Jie ZHAO,Lizhong HU,Zhijun WANG,Heqiu ZHANG
DOI: https://doi.org/10.3969/j.issn.1000-3819.2005.04.017
2005-01-01
Abstract:ZnO thin films were prepared by thermal oxidation and pulsed laser deposition. The morphologies, structures and photoluminescence spectra of the ZnO films were investigated and compared and the mechanics of the UV emission of ZnO thin films were preliminary studied. Compared with PLD method, the ZnO films fabricated by thermal oxidation have stronger UV emission, narrower FWHM of UV peaks and larger ratio of the intensity of UV peaks to visible emission. The reason for it is that the ZnO films fabricated by thermal oxidation have random distribution dendritic microcrystal structure and this is very benefit for UV emission and subsequent measurement. However, the PLD ZnO films have hexangular column structure with high orientation perpendicular to the substrates, and the strongest UV emissions exist in the direction vertical to the lateral surface.
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