Effects Of Rapid Cycle Annealing Temperature On Tbfe Magnetostrictive Films

Hc Jiang,Jp Zhang,Wl Zhang,B Peng,Wx Zhang,Sq Yang,Hw Zhang

DOI: https://doi.org/10.1088/0256-307X/21/8/059

2004-01-01

Chinese Physics Letters

Abstract:The effects of annealing temperature on TbFe films prepared by dc magnetron sputtering were discussed. X-ray diffraction patterns indicate that these polycrystalline films consisting mainly of alpha-Fe and TbFe2 lave phase with grain sizes less than 25 nm can be obtained by a rapid cycle annealing process. Grain sizes can be controlled by varying annealing temperatures. Film hysteresis loop studies show that annealing treatment can improve TbFe film in-plane soft magnetic performances. Magnetic domain structures explored by a magnetic force microscopy show that in the as-deposited films, maze domain structures exist, hence it possesses perpendicular anisotropy and larger anisotropic constant K-u. No domains are observed when annealing temperature is lower than 400degreesC. However, maze domain structures appear again when annealing temperature is higher than 400degreesC. Two maxima of magnetostrictive coefficients are obtained at annealing temperatures of 300degreesC and 500degreesC in the presence of a 40kA(.)m(-1) external magnetic held.