Polymer Gratings with Low Surface Relief Based on Photopolymerization-Induced Internal Diffusion

JB Zhou,CZ Sun,B Xiong,J Wang,Y Luo
DOI: https://doi.org/10.1063/1.1728297
IF: 4
2004-01-01
Applied Physics Letters
Abstract:A photopolymer formulation sensitive to 325 nm ultraviolet light is proposed for the fabrication of polymer gratings based on photopolymerization-induced internal diffusion process. A very low surface relief depth ranging from 12.4 to about 1.0 nm has been demonstrated with a refractive index modulation Δn of about 0.010. Such polymer gratings show promising potentials for the fabrication of low-order distributed feedback polymer lasers.
What problem does this paper attempt to address?