Electrochemical corrosion of Ti-Si-N films coated by pulsed-DC plasma enhanced CVD

Dayan Ma,Xin Wang,Shengli Ma,Kewei Xu
DOI: https://doi.org/10.3321/j.issn:1002-185x.2004.07.016
2004-01-01
Rare Metal Materials and Engineering
Abstract:Multiphase nanocomposite thin films composed of nanocrystalline TiN, nano-sized amorphous Si3N4, and occasionally amorphous or nanocrystalline TiSi2, were deposited on a high speed steel substrate at 550degreesC using an industrial pulsed-DC plasma-enhanced chemical vapor deposition technique. The composition of the films could be controlled well by adjusting the mixing ratio of the chlorides. The Si content in the films varied in a range of 0similar to35at%. The corrosion resistant properties of TiN coatings were significantly increased with certain additions of Si because of appearance of amorphous phase. It was found that negative corrosion occurred when the Si content is 13at% and 20at%. There was a much lower corrosion resistance in higher Si content films because the low conductivity of Si during the formation of the coating resulted in particle coarsening.
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