Micro-analysis of N+ ion-implanted TiNi shape memory alloy

XiangDong Feng,Zhiguo Wang,Xiaotao Zu,Jinyi Dai
DOI: https://doi.org/10.3321/j.issn:1002-185x.2003.04.019
2003-01-01
Rare Metal Materials and Engineering
Abstract:The TiNi shape memory alloy samples were implanted by 75 keV N+ with doses of 3 x 10(17)N(+) cm-(2) and 8 x 10(17)N(+) cm(-2) (dose rate 16.3 muA/cm(2)) at 200degreesC during the ion implantation. The samples were analyzed by X-ray diffraction (XRD) and X-ray photoelectron spectroscopy(XPS). The results showed that the TiN was formed after,the N+ ion implantation. Some TiO2 also formed in the surface of samples, due to the lower vacuum probably. Because the sputtering coefficient of Ni was bigger than that of Ti, so the Ni signal did not show in the XPS pattern between 0 and 1 000 eV.
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