Abstract:In this work, diamond-like carbon (DLC) films were deposited on stainless steel substrates with Si/SiC intermediate layers by combining plasma enhanced sputtering physical vapour deposition (PEUMS-PVD) and microwave electron cyclotron resonance plasma enhanced chemical vapour deposition (MW-ECRPECVD) techniques. The influence of substrate negative self-bias voltage and Si target power on the structure and nano-mechanical behaviour of the DLC films were investigated by Raman spectroscopy, nano-indentation, and the film structural morphology by atomic force microscopy (AFM). With the increase of deposition bias voltage, the G band shifted to higher wave-number and the integrated intensity ratio I(D)/I(G) increased. We considered these as evidences for the development of graphitization in the films. As the substrate negative self-bias voltage increased, particle bombardment function was enhanced and the sp(3)-bond carbon density reducing, resulted in the peak values of hardness (H) and elastic modulus (E). Silicon addition promoted the formation of sp(3) bonding and reduced the hardness. The incorporated Si atoms substituted Sp(2)- bond carbon atoms in ring structures, which promoted the formation of sp(3)-bond. The structural transition from C-C to C-Si bonds resulted in relaxation of the residual stress which led to the decrease of internal stress and hardness. The results of AFM indicated that the films was dense and homogeneous, the roughness of the films was decreased due to the increase of substrate negative self-bias voltage and the Si target power.

Preparation of diamond-like carbon films by high-intensity pulsed-ion-beam deposition at room temperature

Preparation of Anti-Reflective and Protective Diamond-Like Carbon Film on Si Substrate by Femto-Second Pulsed Laser Deposition

Structure and Properties of Diamond-Like Carbon Films Prepared by High-Intensity Pulsed-Ion-beam Ablation Deposition

Deposition of Diamond-Like Carbon Films by High-Intensity Pulsed Ion Beam Ablation at Various Substrate Temperatures

Preparation of Diamond-like Carbon Films by Plasma Source Ion Implantation

CVD of hard DLC films in a radio frequency inductively coupled plasma source

Influence of Substrate Temperature on Structure and Performance of DLC Films Deposited by High-Intensity Pulsed Ion Beam Ablation

High-Power-Density Plasma Deposition of Diamond-Like Carbons Films

Deposition of diamond-like carbon films on an iron substrate by a pulsed high-density plasma beam at room temperature

Structure and Tribology Properties of Diamond-Like Carbon Films Prepared by Microwave Electron Cyclotron Resonance Plasma Source Ion Implantation

Preparation and Characterization of High Quality Diamond Like Carbon Films on Si Microspheres

Study of Diamond-like Carbon Synthesized by Metal Plasma Immersion Ion Implantation and Deposition

Studies of Diamond-Like Carbon (DLC) Films Deposited on Stainless Steel Substrate with Si/SiC Intermediate Layers

Structures and tribological properties of diamond-like carbon films prepared by plasma-based ion implantation on Si

Deposition of nano-diamond-like carbon films by an atmospheric pressure plasma gun and diagnostic by optical emission spectrum on the process

Characterisation of Diamond-like Carbon Films Prepared by Electrochemical Deposition

DLC Film Fabrication on the Inner Surface of a Cylinder by Carbon Ion Implantation

Investigation on the Preparation of High Quality Amorphous Diamond Films

Carbon nanometer films prepared by plasma-based ion implantation on single crystalline Si wafer

Deposition of Diamond-Like Carbon Films Using Hollow Cathode Plasma Source

The properties of N-doped diamond-like carbon films prepared by helicon wave plasma chemical vapor deposition