Design and Implementation of Bireflectance Film

毛文炜,林德教,殷纯永,霍玉晶
DOI: https://doi.org/10.3321/j.issn:1000-0054.2001.11.022
2001-01-01
Abstract:Bireflectance film based on the photoelastic effect is a kind of anisotropic high reflection coating. Coating high reflectance film on the substrate pre applied stress and then remove the stress, the strain of the substrate caused by elastic deformation can be transferred to the film series. The film series becomes anisotropic due to the phtoelastic effect, therefore a relative phase delay is brought out between the two orthogonal polarized reflective components of the mormal incident light. Theoretical analysis and experiments have proved that selecting suitable film series structure, determining appropriate center wavelength and being optimized can get large phase dispersion at working wavelength. Furthermore, orthogonal phase difference of 1.8° can be obtained by applying a force of 100N while reflective index is almost not varied. If this film series is used in He Ne laser, the dual frequency laser with 5MHz beat will be produced. The structural parameters and numerical calculation results of a bireflectance film of the photoelastic effect are presented.
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