Effect of Target Temperature on Microstructure of Aluminum Surface Layer Modified by Plasma Based Ion Implantation

ZJ Zhan,XX Ma,Y Sun,LF Xia
2000-01-01
Abstract:Aluminum (99.6% purity) was implanted with nitrogen ions to a total dose of 6 x 10(17) cm(-2) at different temperatures (from 50 degrees C to 400 degrees C) by plasma based ion implantation (PBII) The surface microstructure was investigated by glancing angle X-ray diffraction (GXRD), X-ray photoelectron spectroscopy (XPS) and cross-sectional transmission electron microscopy (XTEM). The results of GXRD and XTEM showed that there was an amorphous layer on the outer surface, and fine dispersion of AIN precipitates was found under the amorphous layer. The size of AIN precipitates strongly depended on the target temperature, with the increase of the: target temperature, the size of AIN precipitates became larger. The excess nitrogen atoms can diffuse or migrate to the lower nitrogen concentration regions by radiation-enhanced diffusion. The results of XPS further indicated that it was easier to form AIN precipitates at a higher target temperature, and the depth profile of nitrogen broadened.
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