Nucleation of Thin Films on Uncoverage Parts of Substrate

QY Shao,RC Fang,Y Liao

2009-01-01

Abstract:Uncovered parts on substrate are the source of nucleation of thin films. A series of new correction formulas are given for the well-known theory of thin films.

What problem does this paper attempt to address?

INFLUENCE OF COVERAGE ON NUCLEATION AND GROWTH OF THIN FILMS

QY Shao,RC Fang,Y Liao,SJ Han

DOI: https://doi.org/10.7498/aps.48.1509

1999-01-01

Abstract:In nucleation process of thin film growth, stable clusters will gradually cover substrate surface. The growth will occur in the covered parts of substrate, and the nucleation will proceed in the uncovered parts. In this paper, we investigate the influence of coverage on nucleation and growth of thin films and give a series of revised formulae for the widely used theory of thin film growth. We get that the nucleation rate is proportional to the square of uncovered area. It looks rough that the nucleation rate is considered to be a constant in thin film theories.
Cluster Nucleation Limited by Growth Pattern Coverage in Thin Film Preparation from Vapor

QY Shao,QF Zhang,RC Fang,KG Zhu,BX Xu,WM Liu,XY Zhao,JL Wu,ZQ Xue

DOI: https://doi.org/10.1088/1009-1963/10/13/026

2001-01-01

Chinese Physics

Abstract:In the early stage of thin film preparation. from vapor, growth patterns consisting of stable clusters will gradually cover almost the entire substrate surface. During this process, the density of single atoms is zero on growth patterns and the nucleation of clusters will proceed in the substrate parts uncovered by these patterns. The influence of growth pattern coverage on the nucleation of thin films has not been considered wholly in the classical theory of thin films. We will systematically study the influence of growth pattern coverage and give some correction formulas for the widely used classical theory of thin films. It was found that the classical nucleation rate is proportional to the square of the uncovered area. The corrected formulas are of particular importance in the dominant coverage case.
A Computer Simulation of Nucleation and Growth of Thin Films

Zheng Xiaoping,Zhang Peifeng,He Deyan,Liu Jun,Ma Jiantai

DOI: https://doi.org/10.1360/03yw0220

IF: 3.572

2004-01-01

Computational Materials Science

Abstract:A three-dimensional kinetic Monte Carlo technique has been developed for simulating the nucleation and growth of thin films. This model involves incident atom attachment, surface diffusion of the atoms on the growing surface and atom detachment from the growing surface. It takes some new effects into account, such as a significant improvement in calculation of activation energy for the atom diffusion, which renders the model more reasonable. In addition three optimum temperatures and the consistency of their dependence on deposition rate have been found out; the dependence of the surface roughness and relative density on the deposition rate has been discussed; and the approximation of freezing neighbour atoms and periodic boundary conditions has been applied.
Heterogeneous Nucleation on Concave Rough Surfaces: Thermodynamic Analysis and Implications for Nucleation Design

Dongming Yan,Qang Zeng,Shilang Xu,Qi Zhang,Jiyang Wang

DOI: https://doi.org/10.1021/acs.jpcc.6b01693

2016-01-01

The Journal of Physical Chemistry C

Abstract:Addressing heterogeneous nucleation process on materials with complex (superficial) structures is an important issue to understand the thermodynamic principles and forward the engineering applications. Based on classic nucleation theory, we developed a thermodynamic model that is comprised of both the geometry and the surface-structure effects of substrate to represent the process of forming a crystal or drop embryo on a rough concave surface. The model recovers many models developed previously. We extracted two featured factors: ratio factor that indicates the ratio of the critical radius of the embryos forming on the rough concave surface to that on the smooth surface, and shape factor that represents the relative free energy barrier of heterogeneous nucleation of the critical size to that of homogeneous nucleation. Anomalies of both the ratio factor and shape factor were observed for heterogeneous nucleation on the rough concave surface. Our study provides an essential route toward design (or manipulation) of heterogeneous nucleation by structuring the surfaces of the substrate in fractal, through which a number of promising applications in a variety of fields can be envisioned.
Dropwise Condensation Theory Revisited: Part I. Droplet Nucleation Radius

Xiuliang Liu,Ping Cheng

DOI: https://doi.org/10.1016/j.ijheatmasstransfer.2014.11.009

IF: 5.2

2014-01-01

International Journal of Heat and Mass Transfer

Abstract:An improved thermodynamic model is developed for the critical radius for droplet condensation on subcooled surfaces having a promoter coating layer. In addition to heat conduction through the droplet, this model takes into consideration thermal resistances of the coating layer, the liquid–vapor interface, and curvature depression of the equilibrium interface temperature, which are important in nano-size droplets. The critical radius for droplet condensation is obtained based on the availability criterion, and effects of contact angles, degree of subcooling, thickness and thermal conductivity of the coating layer, and saturated pressure on droplet nucleation radius are illustrated. Furthermore, the critical radius for condensation on a superhydrophilic subcooled surface without a promoter coating layer obtained from this new model recovers to the critical radius of droplet condensation in classical heterogeneous nucleation of droplets.
On the Dynamics of Nanostructures Formation during Thin Film Growth.

Daniel Walgraef

DOI: https://doi.org/10.1007/978-94-007-0991-1_24

2004-01-01

Abstract:The deposition of monoatomic layers on a substrate is described by a reactiondiffusion model which combines atomic adsorption, desorption and nonlinear diffusion. Close to the adsorbed layer instability, this dynamics is of the Cahn-Hilliard type, supplemented by linear reaction terms representing adsorption-desorption processes. The instability of uniform layers leads to the formation of nanostructures which correspond to regular spatial variations of substrate coverage. Patterns wavelengthes and symmetries are selected by the dynamics and not by variational arguments. For increasing coverage, one should observe a succession of structures going from hexagonal arrays of high coverage dots, to stripes and finally to hexagonal arrays of low coverage dots. At low deposition rates instability may occur for certain time intervals only, and induce transient structures which may provide templates for further structure development.
Suspended graphene membranes to control Au nucleation and growth

Joachim Dahl Thomsen,Kate Reidy,Thang Pham,Julian Klein,Anna Osherov,Rami Dana,Frances M. Ross

DOI: https://doi.org/10.1021/acsnano.2c00405

2022-07-08

Abstract:Control of nucleation sites is an important goal in materials growth: nuclei in regular arrays may show emergent photonic or electronic behavior, and once the nuclei coalesce into thin films, the nucleation density influences parameters such as surface roughness, stress, and grain boundary structure. Tailoring substrate properties to control nucleation is therefore a powerful tool for designing functional thin films and nanomaterials. Here, we examine nucleation control for metals deposited on two-dimensional (2D) materials in a situation where substrate effects are absent and heterogeneous nucleation sites are minimized. Through quantification of faceted, epitaxial Au island nucleation on graphene, we show that ultra-low nucleation densities with nuclei several micrometers apart can be achieved on suspended graphene under conditions where we measure the nucleation density to be 2-3 orders of magnitude higher on the adjacent supported substrate. We estimate diffusion distances using nucleation theory and find a strong sensitivity of nucleation and diffusion to suspended graphene thickness. We suggest that nucleation site density control via substrate tuning may act as a platform for applications where non-lithographic patterning of metals on graphene is beneficial.

Materials Science
Influence of microstructure of substrate surface on early stage of thin film growth

Helin Wei,Zuli Liu,Kailun Yao

DOI: https://doi.org/10.1016/S0042-207X(99)00193-1

IF: 4

2000-01-01

Vacuum

Abstract:The early stage of thin film growing is studied by a Monte Carlo simulation (MCS). We focus on the effect of the microstructure of the substrate surface (lattice structure and surface defect) at different substrate temperature. The results illustrate that the surface microstructure affects strongly the film morphology with increasing substrate temperature. With increasing temperature, the growth of island film goes through fractal, dendritic and compact growth processes. At high temperature, the island geometry shape resembles the substrate lattice structure. There is a temperature region in which the island film transforms from fractal-to-compact growth, 310-400 K for triangular lattice substrate and about 250-390 K for square lattice substrate. A surface factor is introduced to represent the effect of a non-ideal surface, changing this factor, different island morphologies can be obtained at the same temperature. (C) 2000 Elsevier Science Ltd. All rights reserved.
Study on the Crystallization Behavior of Polymer Thin Films with a Substrate by Computer Simulation

Yongqiang Ming,Tongfan Hao,Zhiping Zhou,Shuihua Zhang,Yijing Nie

DOI: https://doi.org/10.1021/acs.cgd.2c00602

IF: 4.01

2023-10-03

Crystal Growth & Design

Abstract:The dynamics of polymers in ultrathin films can be significantly altered by the substrate interfaces. However, our understanding of how this depends on the film thickness and interface interaction is not mature. Here, the thin film is restricted on the substrate, and the effects of confined structure and interface interaction on crystallization are investigated by using dynamic Monte Carlo simulations. With the decrease in thin film thickness, the crystallization rate of the polymer film system increases gradually due to the enhancement of heterogeneous nucleation effect and the decrease in conformational entropy caused by the increase in chain deformation. Properly increasing the polymer–substrate interactions can reduce the surface free energy of the crystal nucleus. However, when the polymer–substrate interaction is too strong, an irreversible adsorption layer exists that inhibits the occurrence of heterogeneous nucleation. Simulation results verify some experimental phenomena (for instance, crystallization rate and crystal orientation) and observe the evolution process of the microstructure, which cannot be observed in the experiment. Our findings are helpful for the preparation and design of high-performance ultrathin films in experiment and industrial production.

chemistry, multidisciplinary,materials science,crystallography
Kinetic Monte Carlo simulation of nucleation at the initial stage of thin film growth

Peifeng Zhang,Xiaoping Zheng,Deyan He

2005-01-01

Journal of the Korean Physical Society

Abstract:Nucleation at the initial stage of thin film growth has been simulated by using a three-dimensional kinetic Monte Carlo technique. The morphologies of the nucleation were taken by computer-graphic technique. It has been shown that the size of the island nucleation increases with increasing substrate temperature. A maximum nucleation density can be obtained for each deposition rate. The temperature T-n at which the nucleation density maximizes is a function of the deposition rate. The nucleation density decreases with decreasing deposition rate at substrate temperatures higher than T-n. A transition from two-dimensional to three-dimensional nucleation was observed at higher substrate temperatures and lower deposition rates.
In situ growth of ultra-smooth or super-rough thin films by suppression of vertical or horizontal growth of surface mounds

Chaoquan Hu,Jize Cai,Yuankai Li,Chaobin Bi,Zhiqing Gu,Jiaqi Zhu,Jianfeng Zang,Weitao Zheng

DOI: https://doi.org/10.1039/c9tc06683g

IF: 6.4

2020-01-01

Journal of Materials Chemistry C

Abstract:With the development of catalysis, self-cleaning, biomedicine, solid lubrication and precision contact technologies, there is increasing need for ultra-smooth and super-rough functional thin films. However, since the surface roughening mechanism of thin films remains vague, an effective method for in situ growth of ultra-smooth and super-rough films has not been proposed. In this paper, we find that the surface roughening rate (nu(R)) is proportional to the relative vertical-growth coefficient of the mounds (delta) through a series of experiments and simulations on hafnium nitride, hafnium oxide and silver films, which are three typical covalent bonding, ionic bonding, and metallic bonding materials, respectively. This suggests that the formation conditions of the ultra-smooth and super-rough surfaces are delta << 1 and delta >> 1, respectively. Therefore, we propose an effective idea for in situ growth of ultra-smooth and super-rough films, which is to suppress the vertical and horizontal mound growth, respectively. By periodically introducing an amorphous layer (e.g. a-CN) and doping the non-wetting inert metal (e.g. Ag) during the deposition process, we effectively suppress the vertical and horizontal mound growth to prepare ultra-smooth and super-rough hafnium nitride films, respectively. The results show that the roughness range of the hafnium nitride films deposited by the new method is about 5 times larger than that reported in previous studies. Therefore, this study provides a complete understanding of the surface roughening mechanism of thin films and develops a general method for the in situ growth of ultra-smooth or super-rough films.
Heterogeneous Nucleation of Vapor on Insoluble Particles Predicted by an Improved Classical Nucleation Theory

Linhao Yin,Fengxian Fan,Chao Zhang,Longxiang Bu

DOI: https://doi.org/10.1007/s41810-024-00212-0

2024-02-18

Aerosol Science and Engineering

Abstract:The classical nucleation theory (CNT) plays an important role in the investigation of vapor heterogeneous nucleation on solid surfaces. However, the CNT relies on the macroscopic surface tension to describe the formation of a nano-sized embryo, which inevitably causes the model inaccuracy. In this study, an improved CNT is developed by integrating the microscopic surface tension as a function of the embryo size obtained using the molecular dynamics (MD) simulation to enhance the model accuracy. The important heterogeneous nucleation behaviors, including the Gibbs free energy of embryo formation, critical saturation ratio, and nucleation probability, are numerically investigated by the improved CNT. Compared with the CNT with the macroscopic surface tension, the improved CNT using the microscopic surface tension predicts lower Gibbs free energy of embryo formation, lower critical saturation ratio, and higher nucleation probability, particularly when the contact angle of the particle is large. The improved CNT proposed in this study is validated by comparing the numerically predicted critical saturation ratios for the heterogeneous nucleation of water vapor on planar surfaces and on nano- and micron-sized insoluble particles with the experimentally measured data published in literature.

environmental sciences
A Theoretical Analysis for Arbitrary Residual Stress of Thin Film/Substrate System WithNonnegligible Film Thickness

Kunjie Sun,Chen Sun,Jubing Chen

DOI: https://doi.org/10.1115/1.4064207

2024-01-01

Abstract:Stoney formula is widely used in advanced devices to estimate the residual stress of thin film/substrate system by measuring surface curvature. Many hypotheses including that thin film thickness is ignored are required, thus bringing significant error in characterizing the inhomogeneous residual stress distribution. In this article, arbitrary residual stresses on thin film/substrate structures with nonnegligible film thickness are modeled and characterized. We introduce nonuniform misfit strain and establish the governing equations including mismatched strain, displacements, and interfacial stresses based on the basic elastic theory. The parameterization method and the method of constant variation are used in the process of equation decoupling. The expressions between displacements, surface curvatures, and misfit strain are determined through decoupling calculations. By substituting misfit strain, residual stresses are expressed by parametric equation related to surface curvature. It further indicates that there is a “non-local” part between the film stress and curvature at the same point. Compared to neglecting the film thickness, the proposed method eliminate relative errors up to 58.3%, which is of great significance for stress measurement of thin films and substrates.
Nucleation Transition and Nucleus Density Scaling in Surfactant-Mediated Epitaxy

DM Wang,ZJ Ding,X Sun

DOI: https://doi.org/10.1103/physrevb.72.115419

2005-01-01

Abstract:A model of submonolayer epitaxial growth mediated by a monolayer of surfactant is studied, where exchange of adatoms with their underneath surfactant atoms is reversible; i.e., an exchanged adatom can reexchange with the lifted surfactant atom to return to the top of the surfactant layer when the substrate temperature is high enough. A rate equation analysis shows that island nucleation governed by the reexchanging-controlled surface diffusion obeys a scaling law, which connects the nucleation density with the rates of the deposition, surface diffusion, exchange, and reexchange process. Our model system reveals distinct nucleation transitions due to the activated exchange and reexchange, and the nucleation density as a function of temperature exhibits a characteristic N shape with a minimum and a maximum, which define the transition temperatures. The analytical results are confirmed by comparison with kinetic Monte Carlo simulations.
Scaling Behaviors of Surface Roughening of Cu Thin Films Deposited by Oblique Angle Deposition

Liu Bo,Yang Jijun,Tang Rui,Xu Kewei

2012-01-01

Rare Metal Materials and Engineering

Abstract:Cu thin films with different thicknesses were deposited by magnetron sputtering at various oblique angle theta of incidence between the deposition flux and the substrate surface normal. Cross-section microstructure and surface morphology of the films were investigated by scanning electron microscope (SEM) and atomic force microscope (AFM), respectively. Then the scaling behaviors of film surface roughening were analyzed in terms of dynamic scaling theory. With the increasing of the deposition angle theta, the angle phi between grain growth direction and substrate surface normal increased gradually. With increasing theta in the range of <50 degrees, the roughness exponent alpha increased from 0.76 to 0.82 and the growth exponent beta decreased from 0.42 to 0.35. However, when theta increased to 70 degrees, alpha and beta changed to 0.72 to 0.61, respectively. The evolution of the scaling exponents effectively revealed the fact that the film surface roughening arises from the competition between surface diffusion and shadowing effect.
Polymer crystallization of ultrathin films on solid substrates

Yi-Xin Liu,Er-Qiang Chen

DOI: https://doi.org/10.1016/j.ccr.2010.02.017

IF: 24.833

2010-01-01

Coordination Chemistry Reviews

Abstract:Recently, polymer crystallization in ultrathin films (thickness less than 100nm) on solid substrates has attracted increased attention. As it can be considered to be a quasi-two-dimensional (2D) system with one-dimensional (1D) confinement along the substrate normal, ultrathin polymer film offers unique possibilities for testing the theories of crystallization and for studying the effects of confinement and interface which may invoke new mechanisms other than those applied in bulk crystallization of polymers. In this article, we will summarize the important results of ultrathin film crystallization of polymers obtained in the past decades. The morphologies, the crystallization kinetics, and the transformation between monolayer crystals with various metastabilities are reviewed in depth, with an attempt at discussing the ultrathin polymer film crystallization in the general framework of thermodynamics and kinetics of crystallization.
Classical theory of nucleation applied to condensation of a Lennard-Jones fluid

Yijian Wu,Thomas Philippe

2024-10-29

Abstract:The classical nucleation theory (CNT) and its modified versions provide a convenient framework for describing the nucleation process under the capillary approximation. However, these models often predict nucleation rates that depart significantly from simulation results, even for a simple Lennard-Jones fluid. This large discrepancy is likely due to the inaccurate estimation of the driving force for nucleation, which most traditional models estimate within the ideal solution approximation. In this study, we address this issue by directly calculating the driving force for nucleation using equations of state (EOS) and integrating this approach into the calculation of nucleation rates within the framework of CNT and its modified model. We apply this method to examine the condensation of a Lennard-Jones fluid and compare the resulting nucleation rates with molecular dynamics (MD) simulation data. Our results demonstrate that at relatively low supersaturation, where the capillary approximation is reasonable, our thermodynamic models exhibit excellent agreement with MD results, significantly outperforming traditional models. At moderate and high supersaturation, our approach continues to show a reasonable agreement with MD results. Furthermore, when comparing the results obtained by using different EOS, we find that more precise EOS generally yield better agreement with MD data.

Soft Condensed Matter,Chemical Physics
A molecular dynamics study on the boundary between homogeneous and heterogeneous nucleation

Hua Men

DOI: https://doi.org/10.1063/5.0192069

2024-03-07

Abstract:The large discrepancy among the nucleation kinetics extracted from experimental measurements and computer simulations and the prediction of the classical nucleation theory (CNT) has stimulated intense arguments about its origin in the past decades, which is crucially relevant to the validity of the CNT. In this paper, we investigate the atomistic mechanism of the nucleation in liquid Al in contact with amorphous substrates with atomic-level smooth/rough surfaces, using molecular dynamics (MD) simulations. This study reveals that the slightly distorted local fcc/hcp structures in amorphous substrates with smooth surfaces can promote heterogeneous nucleation through a structural templating mechanism, and on the other hand, homogeneous nucleation will occur at a larger undercooling through a fluctuation mechanism if the surface is rough. Thus, some impurities, previously thought to be impotent, could be activated in the homogeneous nucleation experiments. We further find that the initial growth of the nucleus on smooth surfaces of amorphous substrates is one order of magnitude faster than that in homogeneous nucleation. Both these factors could significantly contribute to the discrepancy in the nucleation kinetics. This study is also supported by a recent study of the synthesis of high-entropy alloy nanoparticles assisted with the liquid metal Ga [Cao et al., Nature 619, 73 (2023)]. In this study, we established that the boundary existed between homogeneous and heterogeneous nucleation, i.e., the structural templating is a general mechanism for heterogeneous nucleation, and in its absence, homogeneous nucleation will occur through the fluctuation mechanism. This study provides an in-depth understanding of the nucleation theory and experiments.
Growth and Morphology of Ultra-Thin Al Films on Liquid Substrates Studied by Atomic Force Microscopy

Zheng-Nong Fang,Bo Yang,Miao-Gen Chen,Chu-Hang Zhang,Jian-Ping Xie,Gao-Xiang Ye

DOI: https://doi.org/10.1016/j.tsf.2009.01.017

IF: 2.1

2009-01-01

Thin Solid Films

Abstract:We study the growth process and morphology evolution of the ultra-thin Al films deposited on silicone oil Surfaces by using atomic force microscopy. Initially, the deposited atoms nucleate and form compact clusters on the liquid surfaces. Then the clusters perform Brownian motion and adhere upon impact, which results in the ramified islands. Finally a continuous film forms as the nominal him thickness d increases. The mean size of the grains in the compact clusters and ramified islands is of the order of 10(1) nm. The ultra-thin Al films exhibit a self-affine surface morphology and therefore the dynamic scaling analysis is performed. It is found that the growth exponent beta = 0.23 +/- 0.05. In the range d = 0.1-1.0 nm, the roughness exponent alpha varies from alpha >= 1 to < 1. The physical interpretation for the Crossover of the scaling behavior is presented. (C) 2009 Elsevier B.V. All rights reserved.
Application of Computer: Monte Carlo Simulation of Thin Film Growth

张佩峰,午锁平,郑小平,刘军,贺德衍,岳进

DOI: https://doi.org/10.3321/j.issn:0455-2059.2003.06.008

2003-01-01

Abstract:A three-dimensional kinetic Monte Carlo (KMC) technique has been developed for simulating growth of thin Cu films. It is based on a model that involves incident atoms attachment,surface diffusion and related effects of the atoms on the growing surface,and atoms detachment from the growing surface. A great improvement was made on calculation of the activation barriers for the surface atoms diffusion. The results showed that there exists a critical temperature at a certain deposition rate,the surface roughness decreases and the relative density increases with the increasing substrate temperature,the surface roughness is minimum and the relative density of film saturates when the substrate temperature approach the critical temperature,and then the surface roughness increases with the increasing substrate temperature. The critical temperature is a function of the deposition rate and it increases with the increasing deposition rate. The influence of the deposition rate to surface roughness is different at various substrate temperatures. With the increasing deposition rate,the surface roughness increases at a lower substrate temperature while it decreases at a higher temperature. The result also shows that the relative density decreases with either the increasing deposition or the increasing average thickness of the film.

Nucleation of Thin Films on Uncoverage Parts of Substrate

INFLUENCE OF COVERAGE ON NUCLEATION AND GROWTH OF THIN FILMS

Cluster Nucleation Limited by Growth Pattern Coverage in Thin Film Preparation from Vapor

A Computer Simulation of Nucleation and Growth of Thin Films

Heterogeneous Nucleation on Concave Rough Surfaces: Thermodynamic Analysis and Implications for Nucleation Design

Dropwise Condensation Theory Revisited: Part I. Droplet Nucleation Radius

On the Dynamics of Nanostructures Formation during Thin Film Growth.

Suspended graphene membranes to control Au nucleation and growth

Influence of microstructure of substrate surface on early stage of thin film growth

Study on the Crystallization Behavior of Polymer Thin Films with a Substrate by Computer Simulation

Kinetic Monte Carlo simulation of nucleation at the initial stage of thin film growth

In situ growth of ultra-smooth or super-rough thin films by suppression of vertical or horizontal growth of surface mounds

Heterogeneous Nucleation of Vapor on Insoluble Particles Predicted by an Improved Classical Nucleation Theory

A Theoretical Analysis for Arbitrary Residual Stress of Thin Film/Substrate System WithNonnegligible Film Thickness

Nucleation Transition and Nucleus Density Scaling in Surfactant-Mediated Epitaxy

Scaling Behaviors of Surface Roughening of Cu Thin Films Deposited by Oblique Angle Deposition

Polymer crystallization of ultrathin films on solid substrates

Classical theory of nucleation applied to condensation of a Lennard-Jones fluid

A molecular dynamics study on the boundary between homogeneous and heterogeneous nucleation

Growth and Morphology of Ultra-Thin Al Films on Liquid Substrates Studied by Atomic Force Microscopy

Application of Computer: Monte Carlo Simulation of Thin Film Growth