FORMATION AND STRUCTURE OF VAPOR DEPOSITED (TPP)H2 FILM ON IRON

Chuanwei YAN,Ying LI,Guangling SONG,Chu'nan CAO,Haichao LIN,Liping GUO,Xiangqin LIN
DOI: https://doi.org/10.3969/j.issn.1002-6495.1999.02.002
1999-01-01
Abstract:Vapor deposited (TPP)H 2 film on iron was investigated by means of XPS, SEM, STM and potentiodynamic measurement. It was found that a well-distributed deposited film as base layer was formed at initial stage, then growth of the film on the base layer in particle form. The film is composed of a physically adsorbed outer-layer and chemically bonded inner-layer of (TPP)H 2. The outer layer can be easily removed by DMF solvent. However, Iron porphyrin could not be found on the treated sample surfaces. A model about the structure and composition of the(TPP)H 2 deposited film is put forward.
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