STUDIES OF INTERFACE FORMATION OF Co/GaAs(100) AND THE MAGNETIC PROPERTY OF ULTRATHIN Co FILMS

ZHANG FA-PEI, XU PENG-SHOU, XU FA-QIANG, LU ER-DONG, SUN YU-MING, ZHANG XIN-YI, ZHU JING-SHENG, LIANG REN-YOU
DOI: https://doi.org/10.7498/aps.47.692
1998-01-01
Abstract:Synchrotron radiation photoemission and ferromagnetic resonace(FMR) measurement have been used to study the interface formation of Co/GaAs(100) as well as the magnetic property of ultrathin Co films.The results show strong interface disruption and reaction between overlayer and substrate at low Co coverage(~0.2nm),At the coverage of 1nm,a stable interface forms.The Ga atoms in bulk GaAs may exchange with Co atoms and diffuse into Co overlayer,while a certain amount of As reacts with Co atoms,forming stable Co-As bonding.These reaction products lie in the narrow region near the interface(0.3—0.4nm).The remanent part of As will segregates on the surface of Co overlayer.Based on a theoretical model,the interface structure and concentration profile are discussed in detail.The FMR result demontrates that the ultrathin Co film consists of good-quality crystals and has a chemical homogeneity.
What problem does this paper attempt to address?