Fe–N gradient films and epitaxial Fe16N2 single-crystal films

M. B. Tian,E. Y. Jiang,D. C. Sun

DOI: https://doi.org/10.1116/1.580740

1997-01-01

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Abstract:Fe–N gradient films and epitaxial Fe16N2 single-crystal films were prepared with a facing-target sputtering system. The Rutherford backscattering spectrum, x-ray diffraction, and selected area electron diffraction indicate that the gradient films possess some composition and structure gradient. The α′′-Fe16N2, γ-Fe4N, e-FexN(2<x⩽3), and ζ−Fe2N phases are present in the gradient films at different depths. The α′′-Fe16N2 single-crystal films correspond to a deformed body-centered tetragonal structure with parameters of a=b=5.72 A and c=6.29 A. They grew epitaxially on a NaCl(100) substrate with an orientation relationship of α′′-Fe16N2(001)∥NaCl(001) and α′′-Fe16N2[100]∥NaCl[100]. Perfect electron diffraction patterns with perfect symmetry in the [111], [011], and [001] directions can be observed distinctly by a rotational double tilting sample stand. By controlling N2 partial pressure, substrate temperature, and crystal orientation, α′′-Fe16N2 single-crystal films can be successfully grown epitaxially.