Large Low-Field Magnetoresistance (LFMR) Effect in Free-Standing La 0.7 Sr 0.3 MnO 3 Films
Cheng Zhang,Shuaishuai Ding,Kaiming Qiao,Jia Li,Zhe Li,Zhuo Yin,Jirong Sun,Jing Wang,Tongyun Zhao,Fengxia Hu,Baogen Shen
DOI: https://doi.org/10.1021/acsami.1c03753
2021-06-09
Abstract:The realization of a large low-field magnetoresistance (LFMR) effect in free-standing magnetic oxide films is a crucial goal toward promoting the development of flexible, low power consumption, and nonvolatile memory devices for information storage. La<sub>0.7</sub>Sr<sub>0.3</sub>MnO<sub>3</sub> (LSMO) is an ideal material for spintronic devices due to its excellent magnetic and electronic properties. However, it is difficult to achieve both a large LFMR effect and high flexibility in LSMO films due to the lack of research on LFMR-related mechanisms and the strict LSMO growth conditions, which require rigid substrates. Here, we induced a large LFMR effect in an LSMO/mica heterostructure by utilizing a disorder-related spin-polarized tunneling effect and developed a simple transfer method to obtain free-standing LSMO films for the first time. Electrical and magnetic characterizations of these free-standing LSMO films revealed that all of the principal properties of LSMO were sustained under compressive and tensile conditions. Notably, the magnetoresistance of the processed LSMO film reached up to 16% under an ultrasmall magnetic field (0.1 T), which is 80 times that of a traditional LSMO film. As a demonstration, a stable nonvolatile multivalue storage function in flexible LSMO films was successfully achieved. Our work may pave the way for future wearable resistive memory device applications.The Supporting Information is available free of charge at <a class="ext-link" href="/doi/10.1021/acsami.1c03753?goto=supporting-info">https://pubs.acs.org/doi/10.1021/acsami.1c03753</a>.EDS line information for residual mica fragments; AFM images of different substrates and heterostructures; AFM images of LSMO films deposited at different frequencies; and description and fitting parameters of the spin-polarized intergrain tunneling model (<a class="ext-link" href="/doi/suppl/10.1021/acsami.1c03753/suppl_file/am1c03753_si_001.pdf">PDF</a>)This article has not yet been cited by other publications.
materials science, multidisciplinary,nanoscience & nanotechnology