Controllable Co‐segregation Synthesis of Wafer‐Scale Hexagonal Boron Nitride Thin Films

Chaohua Zhang,Lei Fu,Shuli Zhao,Yu Zhou,Hailin Peng,Zhongfan Liu
DOI: https://doi.org/10.1002/adma.201304301
IF: 29.4
2013-01-01
Advanced Materials
Abstract:A facile and scalable co-segregation method is used to grow hexagonal boron nitride (h-BN) thin films from B- and N-containing metals. By annealing the sandwiched metal substrates in vacuum, sub-monolayer h-BN flakes, monolayer h-BN films, and multilayer h-BN thin films of varying thickness are successfully prepared. This approach follows an underneath-growth mode and exhibits good thickness- and location-control.
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