Abstract:Optical metrology is widely used to characterize surface deformations due to the noncontact, full-field, and highly accurate nature of the measurements. In combination with advanced microscopes, optical metrology methods have recently been extended into the microand nanoscales. In measurements that use the moiré (beat pattern produced between gratings of initially equal spacing) method,1–3 gratings act as sensors that record the original deformation of a specimen. Precise preparation of the gratings is therefore required to ensure accurate measurements. Existing technologies for grating fabrication do not meet all the necessary requirements (i.e., production of high-frequency and large-area gratings at low cost) simultaneously. Ordinary photolithography, due to its diffraction limitation, can generally only produce gratings with hundreds of lines per millimeter. Holographic lithography can be used to make gratings with frequencies of up to 4800 lines per millimeter, but there are strict requirements on the optical system and the alignment techniques. Electron beam lithography and focused ion beam lithography can produce fine gratings with up to 10,000 lines per millimeter, but the grating area is very small (micrometer scale).4, 5 We have developed a new moiré grating fabrication method that is based on the nanoimprint lithography (NIL) technique.6 NIL creates nanoscale patterns through mechanical deformation and has low costs, high throughput, and high resolution. This process has already been used in several microelectronic engineering, optical engineering, and bioengineering applications. Our technique can be used to produce gratings with large areas and high frequencies on different specimens, and at fast rates (see Figure 1).7–9 The preparation of the stamp that is used for imprinting is a key issue in our method. When imprinting is conducted at low pressure, a full-contact condition (between the specimen and Figure 1. (a) Grating fabricated on a traditional (millimeter-scale dimensions) specimen (1200 lines per millimeter, cross type).7 (b) Grating fabricated on a thin (<1 m) film specimen (1200 lines per millimeter, cross type).8

Precise Micro-Cutting Fabrication of Roller Imprint Cylindrical Grating Template

Micro cutting of V-shaped cylindrical grating template for roller nano-imprint

Fabrication of the Grating Mold with Micro-Patterns on the Cylindrical Surface by Step Rotating Lithography

Research on manufacturing technology of nanoimprinted grating

Fabrication of 150 Nm Half-Pitch Grating Templates for Nanoimprint Lithography

Fabrication of digital concatenated gratings using nanoimprint lithography

Study of key processes in the fabrication of high quality diffraction gratings by nanoimprint lithography

Two-Dimensional Grating Fabrication Based on Ultra-Precision Laser Direct Writing System

The fabrication of high-performance diffraction gratings via vibration-assisted UV nanoimprinting lithography

Fabrication of High-Density Moiré Gratings

Fabrication of Micro-Nano Hierarchical Grating Using Revolving Trajectory of Nanoindenter

A nanoimprint lithography for fabricating SU-8 gratings for near-infrared to deep-UV application

Fabrication of nanoscale gratings with reduced line edge roughness using nanoimprint lithography

Experimental Research on Deep-And-Narrow Micromilled Grooves Using a Self-Fabricated PCD Micro-Cutter

Fabrication of Periodic Nanostructure Using a Multi-Tip Diamond Tool: Depth Prediction and Material Removal Mechanism

A Framework of an Ultra-Precision Roller Machining Equipment for the Fabrication of Patterned Microstructured Optics

Fabrication Technique of Nano-Grating Using Afm

Study of Moiré Grating Fabrication on Metal Samples Using Nanoimprint Lithography

Fabrication and evaluation of complicated microstructures on cylindrical surface

Technique of Nano-Grating Fabricated by AFM

Large Area 50nm Period Grating by Multiple Nanoimprint Lithography and Spatial Frequency Doubling