Broadband trapeziform multilayer dielectric grating for femtosecond pulse compressor: Design, fabrication, and analysis

Heyuan Guan,Yunxia Jin,Shijie Liu,Fanyu Kong,Ying Du,Kai He,Kui Yi,Jianda Shao
DOI: https://doi.org/10.1088/1054-660X/23/11/115301
IF: 1.2
2013-01-01
Laser Physics
Abstract:Rectangular HfO2 grating fabrication is difficult, so a trapeziform multilayer dielectric pulse compression grating (PCG) has been designed using a genetic algorithm and the Fourier mode method. Simulation results show that a greater than 120 nm wavelength range multilayer dielectric grating (MDG) is obtained with a minus-first-order diffraction efficiency (DE) exceeding 95%. The bandwidth is 136 nm with the minus-first-order DE exceeding 90%. The trapeziform structure shows good tolerances for grating fabrication. The multilayer dielectric is deposited by e-beam evaporation, then the MDG is fabricated by reactive ion beam etching. A 128 nm bandwidth of the MDG for the transverse electric polarization with an efficiency exceeding 90% is obtained, and the maximum DE can reach up to 98.3%. The trapeziform MDG is an ideal PCG for chirped pulse amplification systems with high DE, broad bandwidth and good fabrication tolerances. Laser-induced damage thresholds of 0.53 J cm(-2) under 40 fs pulses are experimentally reached with very high and uniform efficiency.
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