Development Of High-Precision Ultrasonic Microscopy Measurement System And Measurement Of The Surface Wave Velocities Of (100) Silicon Wafer

Song Guorong,Lu Yan,Gao Zhongyang,Liu Yanli,Guo Yinghui,He Cunfu,Wu Bin
DOI: https://doi.org/10.1784/insi.2012.55.5.253
2013-01-01
Abstract:A high-precision ultrasonic microscopy measurement system was developed in order to non-destructively test the mechanical properties of metal sheet and coating materials. The whole system is based on acoustic microscopy techniques. The ultrasonic waves are excited and received by a line-focus transducer. This paper presents the principles and methods of the surface wave velocity measurements using this system. The surface wave velocity is measured along different propagation directions on a (100) silicon wafer. The results of the measurement have good repeatability and consistency in the symmetry directions. They indicate that the system shows high accuracy and fine stability at defocusing positions and rotation angles. The system meets the measurement requirements for isotropic and an isotropic materials. In addition, this acoustic characterisation method can be used to measure the wave velocity at different frequencies, so the dispersion curves of the sheet metal and coating specimen can be measured by this method. As a result, the mechanical properties of the materials can be calculated by fitting the theoretical and experimental dispersion curves.
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