Study on the oxygenation process during the heat treatment of TFA-MOD YBCO thin films by in situ resistance measurement

Timing Qu,Yunran Xue,Feng Feng,Rongxia Huang,Wei Wu,Kai Shi,Zhenghe Han
DOI: https://doi.org/10.1016/j.physc.2013.04.078
2013-01-01
Abstract:•In situ resistance measurement (ISM) was carried out on MOD-YBCO thin films.•Thermodynamic behaviors of the oxygenation process were studied by using ISM.•A defect reaction was found to control the mechanism of the oxygenation process.•Porosity accelerated diffusion mechanism was proposed for the MOD thin film system.
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