Large Area Metal Nanowire Arrays with Submicron Pitch and Tunable Sub-20 Nm Nanogaps

Le Thi Ngoc, L.,Jin, M.,van den Berg, A.,Carlen, E.T.
DOI: https://doi.org/10.1109/transducers.2013.6626738
2013-01-01
Abstract:We present a new top-down nanofabrication technology to realize large area metal nanowire (m-NW) arrays with tunable sub-20 nm separation nanogaps without the use of chemical etching or milling of the metal layer. The nanofabrication technology is based on a self-regulating metal deposition process that is facilitated by closely spaced and isolated heterogeneous template surfaces that confines the metal deposition into two dimensions. Electrically isolated parallel arrays of m-NW can be realized with uniform and controllable nanogaps. Au-NW arrays are presented with high-density ~105 NWs cm-1, variable NW diameters down to 50 nm, variable nanogaps down to 5 nm, and very large nanogap length density ~1 km cm-2. A spatially averaged surface enhanced Raman scattering (SERS) analytical enhancement factor of (1.5±0.2)×107 is demonstrated from a benzenethiol monolayer chemisorbed on a Au-NW array substrate.
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