Enhanced Tunnelling Electroresistance Effect Due to a Ferroelectrically Induced Phase Transition at a Magnetic Complex Oxide Interface.

Y. W. Yin,J. D. Burton,Y-M. Kim,A. Y. Borisevich,S. J. Pennycook,S. M. Yang,T. W. Noh,A. Gruverman,X. G. Li,E. Y. Tsymbal,Qi Li
DOI: https://doi.org/10.1038/nmat3564
IF: 41.2
2013-01-01
Nature Materials
Abstract:The tunnelling electroresistance effect that occurs at ferroelectric tunnel junctions could form the basis for a class of potential memory applications. Now, an enhanced effect is observed in a complex oxide interface as a result of a ferroelectrically induced phase transition.
What problem does this paper attempt to address?