Influence of target composition and deposition temperature on the domain structure of BiFeO3 thin films

Rui Guo,Lu You,M. Motapothula,Zhen Zhang,Mark B H Breese,Lang Chen,Di Wu,Junling Wang
DOI: https://doi.org/10.1063/1.4757938
IF: 1.697
2012-01-01
AIP Advances
Abstract:Domain structure of BiFeO3 thin films can be controlled by adjusting the target composition or the substrate temperature during pulsed laser deposition. Decreasing Bi content in the target or increasing substrate temperature changes the domain structure of BiFeO3 from 71 degrees to 109 degrees. We suggest that a combination of interface effect and defect induced internal field causes this evolution. Copyright 2012 Author(s). This article is distributed under a Creative Commons Attribution 3.0 Unported License. [http://dx.doi.org/10.1063/1.4757938]
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