Monolithic Integration of an Algan/Gan Metal-Insulator Field-Effect Transistor with an Ultra-Low Voltage-Drop Diode for Self-Protection

Wang Zhi-Gang,Chen Wan-Jun,Zhang Jing,Zhang Bo,Li Zhao-Ji
DOI: https://doi.org/10.1088/1674-1056/21/8/087305
2012-01-01
Chinese Physics B
Abstract:In this paper, we present a monolithic integration of a self-protected AlGaN/GaN metal—insulator field-effect transistor (MISFET). An integrated field-controlled diode on the drain side of the AlGaN/GaN MISFET features a self-protected function for a reverse bias. This diode takes advantage of the recessed-barrier enhancement-mode technique to realize an ultra-low voltage drop and a low turn-ON voltage. In the smart monolithic integration, this integrated diode can block a reverse bias (> 70 V/μm) and suppress the leakage current (< 5 × 10−11 A/mm). Compared with conventional monolithic integration, the numerical results show that the MISFET integrated with a field-controlled diode leads to a good performance for smart power integration. And the power loss is lower than 50% in conduction without forward current degeneration.
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