Block Copolymer-Templated Chemical Nanopatterning on Pyrolyzed Photoresist Carbon Films

Xin Deng,Jillian M. Buriak,Pei-Xia Dai,Li-Jun Wan,Dong Wang

DOI: https://doi.org/10.1039/c2cc35010f

IF: 4.9

2012-01-01

Chemical Communications

Abstract:Block copolymer nanolithography has been extended to the nanopatterning of organic functionalities on pyrolyzed photoresist carbon films (PPFs) via diazonium chemistry, using PS-b-P4VP as the template.

What problem does this paper attempt to address?

Recent progress in non-photolithographic patterning of polymer thin films

Mingjun Qiu,Weiwei Du,Shangyu Zhou,Pengzhe Cai,Yingwu Luo,Xiaoxue Wang,Rong Yang,Junjie Zhao

DOI: https://doi.org/10.1016/j.progpolymsci.2023.101688

IF: 31.281

2023-01-01

Progress in Polymer Science

Abstract:Patterned polymer thin films are essential components in many devices and applications owing to the multi-functionality, flexibility, lightweight and cost-efficiency. Unfortunately, conventional photolithography needs the use of developers and strippers which contain solvents and reagents that may dissolve, swell or degrade the polymer thin film substrates. Alternatively, non-photolithographic strategies provide alternative options and avoid the complicated optical systems, offering versatile routes for fabricating polymeric micro- and nanostructures. In this review, we summarize the recent progress in non-photolithographic patterning methods including soft lithography, nanoimprint lithography, direct writing, self-assembly of block copolymers, area-selective vapor phase deposition and instability induced patterning. These patterning approaches have been applied to various applications such as chromic devices, polymer light-emitting diodes, sensors, transistors, and protein and cellular engineering and many other scenarios. Finally, the subsisting challenges and future research directions of non-photolithographic patterning approaches are highlighted from the aspect of resolution, reliability and scalability.
Composition Design of Block Copolymers for Porous Carbon Fibers

Joel Marcos Serrano,Tianyu Liu,Assad U. Khan,Brandon Botset,Benjamin J. Stovall,Zhen Xu,Dong Guo,Ke Cao,Xi Hao,Shengfeng Cheng,Guoliang Liu

DOI: https://doi.org/10.1021/acs.chemmater.9b02918

IF: 10.508

2019-01-01

Chemistry of Materials

Abstract:Block copolymer-based porous carbon fibers (PCFs) exhibit hierarchical porous structures, high surface areas, and exceptional electrochemical properties. However, the design of block copolymers for PCFs remains a challenge in advancing this type of fibrous material for energy storage applications. Herein, we have systematically synthesized a series of poly(methyl methacrylate-block-acrylonitrile) (PMMA-b-PAN) with well-controlled molecular weights and compositions to study the physical and electrochemical properties of PCFs. PCFs are synthesized via electrospinning, self-assembly, oxidation, and pyrolysis with no additives or chemical activation. By adjusting the molecular weights of polyacrylonitrile (PAN) and poly(methyl methacrylate) blocks, we have achieved tunable mesopore sizes ranging from 10.9 to 18.6 nm and specific capacitances varied from 144 to 345 F g (-1) at 10 mV s(-1). Interestingly, regardless of the volume fraction of PAN, all the block copolymers produce hierarchical porous structures because of the self-assembly and cross-linking of PAN. Block copolymers with a PAN volume fraction of near 50% show the highest surface areas and gravimetric capacitances. The PCFs represent a new platform material with tunable specific surface areas, pore sizes, and electrochemical properties. This work has an immediate impact on designing block copolymers to create PCFs for applications in energy conversion and storage.
Ultrasmooth Polydopamine Modified Surfaces for Block Copolymer Nanopatterning on Flexible Substrates

Joon Hee Cho,Reika Katsumata,Sunshine X. Zhou,Chae Bin Kim,Austin R. Dulaney,Dustin W. Janes,Christopher J. Ellison

DOI: https://doi.org/10.1021/acsami.6b00626

2016-03-11

Abstract:Nature has engineered universal, catechol-containing adhesives which can be synthetically mimicked in the form of polydopamine (PDA). In this study, PDA was exploited to enable the formation of block copolymer (BCP) nanopatterns on a variety of soft material surfaces. While conventional PDA coating times (1 h) produce a layer too rough for most applications of BCP nanopatterning, we found that these substrates could be polished by bath sonication in a weakly basic solution to form a conformal, smooth (root-mean-square roughness ∼0.4 nm), and thin (3 nm) layer free of large prominent granules. This chemically functionalized, biomimetic layer served as a reactive platform for subsequently grafting a surface neutral layer of poly(styrene-random-methyl methacrylate-random-glycidyl methacrylate) to perpendicularly orient lamellae-forming poly(styrene-block-methyl methacrylate) BCP. Moreover, scanning electron microscopy observations confirmed that a BCP nanopattern on a poly(ethylene terephthalate) substrate was not affected by bending with a radius of ∼0.5 cm. This procedure enables nondestructive, plasma-free surface modification of chemically inert, low-surface energy soft materials, thus overcoming many current chemical and physical limitations that may impede high-throughput, roll-to-roll nanomanufacturing.

materials science, multidisciplinary,nanoscience & nanotechnology
Multifunctional Photodegradable Polymers for Reactive Micropatterns

Lei Li,Xin-Xing Deng,Zi-Long Li,Fu-Sheng Du,Zi-Chen Li

DOI: https://doi.org/10.1021/ma501019c

IF: 5.5

2014-01-01

Macromolecules

Abstract:We report the first example of realizing the multi-functionalization of photodegradable polymers for the preparation of reactive micropatterns. Three o-nitrobenzaldehyde monomers (M1, M2, and M3) with ally!, propargyl, and epoxy groups were synthesized in high yields by the simple reactions of 5-hydroxy-2-nitro-benzaldehyde with ally! bromide, propargyl bromide, and epichlorohydrin, respectively. Passerini multicomponent polymerization (Passerini MCP) of M1, M2, or M3 with 1,6-hexanedioic acid and 1,6-diisocyanohexane generated three poly(ester-amide)s (P1, P2, and P3), the ester linkages of which were o-nitrobenzyl derivatives with functional groups from the corresponding monomers. Therefore, these polymers are photodegradable and can also be further modified by efficient click reactions like thiol-ene, copper catalyzed azide- alkyne cycloaddition (CuAAC), and epoxy amine reaction. Furthermore, Passerini MCP of M1, M2, and M3 with 1,6-hexanedioic acid and 1,6-diisocyanohexane could yield a photodegradable triply functional polymer (P4) containing all the three functional side groups which can be further modified by sequential click reactions. All the polymers were thoroughly characterized by H-1 NMR and GPC. Degradation of the polymers in solution under UV irradiation was investigated by UV vis and GPC, and they can all be photocleaved into oligomers and small molecules in 30 min. These functional polymers are extremely useful as positive photoresists to create reactive micropatterns. As an example, the triply functional polymer film was fabricated and cross-linked by epoxy amine reaction. After photoirradiation under a mask, reactive patterns with allyl and propargyl groups were obtained. Sequential modification of the reactive sites by CuAAC and thiol-ene reactions afforded multifunctional patterned surfaces with tunable properties as confirmed by scanning electron micrograph (SEM) and confocal fluorescence microscopy.
A Facile Method of Forming Nanoscale Patterns on Poly(ethylene Glycol)-Based Surfaces by Self-Assembly of Randomly Grafted Block Copolymer Brushes.

Xiang Gao,Wei Feng,Shiping Zhu,Heather Sheardown,John L. Brash

DOI: https://doi.org/10.1021/la800729c

IF: 3.9

2008-01-01

Langmuir

Abstract:Poly(oligo(ethylene glycol) methacrylate) (POEGMA) block poly(methyl methacrylate) (PMMA) brushes were synthesized on the silicon wafer surfaces by the surface-initiated atom transfer radical polymerization (ATRP) method. Atomic force microscopy, ellipsometry, and water contact angle methods were employed to study the surface morphology and stimulus-response behavior. It was found that simple solvent treatments could induce phase segregation of the POEGMA and PMMA segments thus introducing nanoscale patterns. The feature size could be less than 10 nm and was tunable on the nanoscale. Various patterns including spherical aggregates, wormlike aggregates, stripe patterns, perforated layers, and complete overlayers were obtained through adjusting the upper block layer thickness. These patterns could switch between the different morphologies reversibly after the treatment with selective solvents.
Directed self-assembly of high-chi block copolymer for nano fabrication of bit patterned media via solvent annealing

Shisheng Xiong,Yves-Andre Chapuis,Lei Wan,He Gao,Xiao Li,Ricardo Ruiz,Paul F Nealey

DOI: https://doi.org/10.1088/0957-4484/27/41/415601

IF: 3.5

2016-09-08

Nanotechnology

Abstract:We report the formation of nanoimprint master templates that can be used for the fabrication of bit patterned media (BPM). The template was formed by directed self-assembly, with solvent annealing, of a symmetric ABA triblock copolymer to form perpendicularly oriented lamellae on chemical patterns. We used a high-χ block copolymer, poly(2-vinyl pyridine)-block-polystyrene-block-poly(2-vinyl pyridine) to achieve smaller feature sizes than are possible with polystyrene-block-poly(methyl methacrylate). The work shows that triblock copolymers can provide a large processing window in terms of pitch commensurability. Using block-selective infiltration (atomic layer deposition with sequential long soaking/purge cycles), an alumina composite with high etch resistance was specifically incorporated into the polar and hydrophilic P2VP domains. Subsequently, the surface pattern was successfully transferred into underlying Si substrates by etching with a fluorine-containing plasma to create a nanoimprint master. The line/space pattern of the nanoimprint master met the BPM fabrication requirement of defectivity <10(-3). For demonstration purposes, the nanoimprint master was used to imprint a replica pattern of photoresist on a quartz wafer.

materials science, multidisciplinary,physics, applied,nanoscience & nanotechnology
High molecular weight block copolymer lithography for nanofabrication of hard mask and photonic nanostructures

Sozaraj Rasappa,Hanna Hulkkonen,Lars Schulte,Sokol Ndoni,Jarno Reuna,Turkka Salminen,Tapio Niemi

DOI: https://doi.org/10.1016/j.jcis.2018.09.040

2019-01-15

Abstract:An unusual dot pattern was realized via self-assembly of high molecular weight polystyrene-block-polydimethylsiloxane (PS-b-PDMS) copolymer by a simple one-step solvent annealing process, optimized based on Hansen solubility parameters. Annealing PS-b-PDMS under neutral solvent vapors at room temperature produces an ordered arrangement of dots with ∼112 nm spacing and ∼54 nm diameter. The template is highly resistant to dry etching with chlorine-based plasma, enabling its utilization on a variety of hard masks and substrates. The self-assembled PDMS dots were further exploited as a template for direct patterning of silicon, metal, and dielectric materials. This nanopatterning methodology circumvents expensive and time-consuming atomic layer deposition, wet processes, and sequential infiltration techniques. Application-wise, we show a process to fabricate nanostructured antireflection surfaces (nanocones) on a 2 in. silicon wafer, reducing the reflectance of planar silicon from 35% to below 0.5% over a broad wavelength range. Alternatively, nanocones made of TiO2 on silicon exhibit low reflectance (<3%) and improved transmittance into the substrate at the visible wavelength range. The measured optical properties concur with the simulation results. The versatility of the PS-b-PDMS templates was further utilized for nanopatterning materials such as silicon-on-insulator substrates, gallium arsenide, aluminum indium phosphide, and gallium nitride, which are important in electronics and photonics.
Patterning of triblock copolymer film and its application for surface-enhanced Raman scattering

Hai-liang Huang,Guo-bin Yi,Xi-hong Zu,Ben-bin Zhong,Hong-sheng Luo

DOI: https://doi.org/10.1007/s10118-017-1914-9

2017-03-05

Chinese Journal of Polymer Science

Abstract:In this paper, microphase behavior of an ABC triblock copolymer, polystyrene-block-poly(2-vinylpyridine)-block-poly( ethylene oxide), namely PS-b-P2VP-b-PEO, was systematically studied during spin-coating and solvent vapor annealing based on various parameters, including the types of the solvent, spin speed and thickness. The morphological features and the microdomain location of the different blocks were characterized by atomic force microscope (AFM) and high resolution transmission electron microscopy (HRTEM). With increasing thickness, the order-order transition from nanopores array to the pattern of nanostripes was observed due to microdomain coarsening. These processes of pattern transformation were based on the selectivity of toluene for different blocks and on the contact time between solvent molecules and the three blocks. This work provides different templates for preparation of gold nanoparticle array on silicon wafer, which can be adopted as an active surface-enhanced Raman scattering (SERS) substrate for poly(3-hexylthiophene) (P3HT).

polymer science
Carbon Nanopatterns and Nanoribbons from Directly Nanoimprinted Polyacrylonitrile: Correlation Between Crystallite Orientation and Nanoimprint Process

Zheng Zhang,Daniela Molina Piper,Seoung-Bum Son,Seul Cham Kim,Kyu Hwan Oh,Se-Hee Lee,Yifu Ding

DOI: https://doi.org/10.1016/j.polymer.2013.07.076

IF: 4.6

2013-01-01

Polymer

Abstract:We present the fabrication of lithographically defined carbon patterns and nanoribbons using a common carbon precursor, polyacrylonitrile (PAN). This method is based on nanoimprint lithography and has been demonstrated to be reliable and capable of nanofabrication over a large surface area at low cost, compared with current carbon-patterning techniques. Most interestingly, the deformation profile of the PAN during the imprinting process resulted in a distribution of aligned PAN chains within the patterns, which led to a similar anisotropic correlation of the carbon crystallites in the carbonized structures.
Electrostatic Crosslinking-Enabled Highly Asymmetric Lamellar Nanostructures of Polyzwitterionic Block Copolymers for Lithography.

Shi-Peng Ding,Ze-Kun Zhang,Ze Ye,Ding-Li Xia,Jun-Ting Xu

DOI: https://doi.org/10.1039/d3nr00073g

IF: 6.7

2023-01-01

Nanoscale

Abstract:Intermolecular coulombic interactions induce physical crosslinking and thus the formation of highly asymmetric lamellar nanostructures in a broad composition range for polyzwitterionic block copolymers.
Polyvinylpyrrolidone Hybrid Photoresist for Two-color Sensitive Direct Laser Writing

Chun Cao,Yi-wei Qiu,Jian-ting Liu,Da-zhao Zhu,Chen-liang Ding,Zhen-yao Yang,Cui-fang Kuang,Xu Liu

DOI: https://doi.org/10.11777/j.issn1000-3304.2021.21323

2022-01-01

Acta Polymerica Sinica

Abstract:Organic-polymer photoresist is the medium and carrier of micro manufacturing by two-color sensitive direct laser writing technology, which directly affects the accuracy and authenticity of the micro structures. In this work, polyvinylpyrrolidone (PVP) is introduced into pentaerythritol triacrylate (PETA) to control the viscosity, mechanical strength, volume shrinkage and polymerization rate of photoresist. The results show that hydrogen bond is formed between PVP and PETA, which can be used as a crosslinking site to improve the crosslinking degree of photoresist. Meanwhile, the introduction of PVP also increases the viscosity of the system, reduces the oxygen inhibition, and finally effectively improves the photo-polymerization conversion rate (30.1%) of PETA in photoresist, obtaining higher sensitivity and lower polymerization threshold (6.5 mW, 20 wt% PVP). In addition, the PVP sharply reduces the volume shrinkage of photoresist from 18% to 3%, greatly weakening the internal stress of the fabricated structure, thus improving the lithography performance of micro structures. Finally, the minimum linewidth of PVP composited photoresist can reach 48 nm, which has higher uniformity and regularity than that of photoresist without PVP. Thus, this work is of great significance for high-precision and high-quality micro manufacturing and various applications. [GRAPHICS]
Ultra-Fast Block Copolymers for Sub-5 Nm Lithographic Patterning

Xuemiao Li,Chenxu Wang,Jianuo Zhou,Zhenyu Yang,Yan Zhang,Hai Deng

DOI: https://doi.org/10.2494/photopolymer.31.483

2018-01-01

Journal of Photopolymer Science and Technology

Abstract:DSA lithography is a chemical assisted patterning approach, which has attracted a great deal of interest due to its potential high resolution and low cost. Researchers around the world discovered some sub-5 nm high resolution DSA materials, and all these materials required high annealing temperature or long annealing time. In this study, we design and synthesize some PS-typed and PMMA-typed fluoro-containing BCPs. The finest half pitch of these BCPs is less than 5 nm. And the thermal annealing time of PS-typed BCPs is optimized to 1 min, which has been the highest assembly speed for sub-5 nm nanopatterning. The self-assembly speed of PMMA-typed BCPs is much slower than the PS-typed. We further exhibit that ordered nanopatterns are assembled to appear straight 10 nm lines in the silicon template.
Patterning of polypyrrole using protein-based template and their potential application in resist

Dong Wang,Xing Zhou,Chenxi Wang,Changqing Fang,Wei Zhang,Yingwei Huang

DOI: https://doi.org/10.1016/j.polymer.2020.123151

IF: 4.6

2021-01-01

Polymer

Abstract:Micropatterned conducting polymer such as polypyrrole (PPy) have attracted growing interest due to their unique properties, such as high electrical conductivity, facile synthesis and well stability. In this work, precise control the micropattern is conceived into bovine serum albumin (BSA)/polypyrrole(PPy) hybrid film as a template or resist for photo lithography. The hybrid films are prepared by a facile and assembly in moderate conditions with handleability. According to the analyses, mircropatterned BSA/PPy film could introduce other valuable characteristics for micro-fabrication in addition to electrical conductivity, such as photosensitive features and adhesion. The patterns can be realized onto underlying Au/Cu/Si/PET substrates. Photo lithography on BSA/PPy film-based template could generate geometrically complex micropatterns at an irradiation dose of 8000 μC/cm2. Furthermore, the investigation for the hybrid as resist in chemical etching system suggests that the hybrid can be transferred on the silicon substrate, demonstrating the practical significance in the micro-fabrication field. The BSA/PPy film provides a novel and green material for the micro-fabrication of polypyrrole, promoting micro-device applications.

polymer science
Engineering Topochemical Polymerizations Using Block Copolymer Templates.

Liangliang Zhu,Helen Tran,Frederick L. Beyer,Scott D. Walck,Xin Li,Hans Agren,Kato L. Killops,Luis M. Campos

DOI: https://doi.org/10.1021/ja507318u

IF: 15

2014-01-01

Journal of the American Chemical Society

Abstract:With the aim to achieve rapid and efficient topochemical polymerizations in the solid state, via solution-based processing of thin films, we report the integration of a diphenyldiacetylene monomer and a poly(styrene-b-acrylic acid) block copolymer template for the generation of supramolecular architectural photopolymerizable materials. This strategy takes advantage of non-covalent interactions to template a topochemical photopolymerization that yields a polydiphenyldiacetylene (PDPDA) derivative. In thin films, it was found that hierarchical self-assembly of the diacetylene monomers by microphase segregation of the block copolymer template enhances the topochemical photopolymerization, which is complete within a 20 s exposure to UV light. Moreover, UV-active cross-linkable groups were incorporated within the block copolymer template to create micropatterns of PDPDA by photolithography, in the same step as the polymerization reaction. The materials design and processing may find potential uses in the microfabrication of sensors and other important areas that benefit from solution-based processing of flexible conjugated materials.
Directed Carbon Nanotube Assembly Using a Pyrene-Functionalized Polymer

Eric Schopf,Rebecca Broyer,Lei Tao,Yong Chen,Heather D. Maynard

DOI: https://doi.org/10.1039/b908282d

IF: 4.9

2009-01-01

Chemical Communications

Abstract:A pyrene-functionalized polymer was patterned viaelectron beam lithography onto a silicon wafer and shown to selectively bind with carbon nanotubes.
Directed Block Copolymer Self-Assembly Implemented Via Surface-Embedded Electrets

Mei-Ling Wu,Dong Wang,Li-Jun Wan

DOI: https://doi.org/10.1038/ncomms10752

IF: 16.6

2016-01-01

Nature Communications

Abstract:Block copolymer (BCP) nanolithography is widely recognized as a promising complementary approach to circumvent the feature size limits of conventional photolithography. The directed self-assembly of BCP thin film to form ordered nanostructures with controlled orientation and localized pattern has been the key challenge for practical nanolithography applications. Here we show that BCP nanopatterns can be directed on localized surface electrets defined by electron-beam irradiation to realize diverse features in a simple, effective and non-destructive manner. Charged electrets can generate a built-in electric field in BCP thin film and induce the formation of perpendicularly oriented microdomain of BCP film. The electret-directed orientation control of BCP film can be either integrated with mask-based patterning technique or realized by electron-beam direct-writing method to fabricate microscale arbitrary lateral patterns down to single BCP cylinder nanopattern. The electret-directed BCP self-assembly could provide an alternative means for BCP-based nanolithography, with high resolution.
Controllable Preparation of Block Copolymer Films with Self- Organized Patterns for the Template of Closely - Spaced Nanoparticle Array Formation

YANG Ling,ZHANG Jia-lan,CHEN Yan-ping,DING Kui,XIE Bo,ZHOU Feng,WANG Guang-hou,HAN Min

DOI: https://doi.org/10.3969/j.issn.1007-4252.2008.01.024

2008-01-01

Abstract:Block copolymer thin films with controllable self-organized patterns were prepared by solvent-induced order-disorder transition method.The rate of solvent evaporating from thin solution-cast block copolymer films was controlled and used to manipulate the orientation of copolymer assemblies.With the decreasing of the solvent evaporation rate,the surface morphologies of the block copolymer films changed from disordered spherical pits to hexagonal spherical pits,hybrid morphology of spherical pits and in-plane cylinders,and finally to in-plane cylinders.A Closely-spaced nanoparticle array was fabricated with depositing gas-phase silver nanoclusters onto the as-prepared block copolymer template.
Photocatalytic Printing of Inorganic Nanopatterns Via Poly(Styrene-Block-Carbosilane) Copolymer Thin Films on Titania Substrates

Juan Peng,Alejandra Garcia Marcos,Seong-Jun Jeong,Holger Frey,Dong Ha Kim

DOI: https://doi.org/10.1039/b816398g

IF: 4.9

2009-01-01

Chemical Communications

Abstract:Well-defined, ordered arrays of nanoscale depressions were obtained in linear-brush-type polystyrene-block-polycarbosilane (PS-b-PCS) diblock copolymer thin films by acetone vapor annealing and silica nanodot arrays were directly obtained from such thin films deposited on a titania substrate by one-step exposure to UV light as a result of transformation of the PCS units to silica, driven by the photocatalytic activity of titania concurrent with removal of the organic matrix.
The One-Pot Directed Assembly of Cylinder-Forming Block Copolymer on Adjacent Chemical Patterns for Bimodal Patterning.

Tzu-Hsuan Chang,Shisheng Xiong,Chi-Chun Liu,Dong Liu,Paul F Nealey,Zhenqiang Ma

DOI: https://doi.org/10.1002/marc.201700285

IF: 5.006

2017-01-01

Macromolecular Rapid Communications

Abstract:The direct self-assembly of cylinder-forming poly(styrene-block-methyl-meth-acrylate) (PS-b-PMMA) block copolymer is successfully assembled into two orientations, according to the underlying guiding pattern in different areas. Lying-down and perpendicular cylinders are formed, respectively, depending on the design of chemical pattern: sparse line/space pattern or hexagonal dot array. The first chemical pattern composed of prepatterned cross-linked polystyrene (XPS) line/space structure has a period (LS) equal to twice the intercylinder period of the block copolymer (L-0). The PS-b-PMMA thin film on the prepared chemical template after thermal annealing forms a lying-down cylinder morphology when the width of the PS strips is less than the width of PS block in the PS-b-PMMA block copolymer. The morphology is only applicable at the discrete thickness of the PS-b-PMMA film. In addition to forming the lying-down cylinders directly on the XPS guiding pattern, the cylinder-forming block copolymer can also be assembled in a perpendicular way on the second guiding pattern (the hexagonal dot array). The block copolymer films are registered into two orientations in a single directed self-assembly process. The features of the assembled patterns are successfully transferred down to the silicon oxide substrate.
Growing Embossed Nanostructures of Polymer Brushes on Wet-Etched Silicon Templated Via Block Copolymers

Xiaobin Lu,Qin Yan,Yinzhou Ma,Xin Guo,Shou-Jun Xiao

DOI: https://doi.org/10.1038/srep20291

IF: 4.6

2016-01-01

Scientific Reports

Abstract:Block copolymer nanolithography has attracted enormous interest in chip technologies, such as integrated silicon chips and biochips, due to its large-scale and mass production of uniform patterns. We further modified this technology to grow embossed nanodots, nanorods and nanofingerprints of polymer brushes on silicon from their corresponding wet-etched nanostructures covered with pendent SiH x ( X = 1–3) species. Atomic force microscopy (AFM) was used to image the topomorphologies and multiple transmission-reflection infrared spectroscopy (MTR-IR) was used to monitor the surface molecular films in each step for the sequential stepwise reactions. In addition, two layers of polymethacrylic acid (PMAA) brush nanodots were observed, which were attributed to the circumferential convergence growth and the diffusion-limited growth of the polymer brushes. The pH response of PMAA nanodots in the same region was investigated by AFM from pH 3.0 to 9.0.

Block Copolymer-Templated Chemical Nanopatterning on Pyrolyzed Photoresist Carbon Films

Recent progress in non-photolithographic patterning of polymer thin films

Composition Design of Block Copolymers for Porous Carbon Fibers

Ultrasmooth Polydopamine Modified Surfaces for Block Copolymer Nanopatterning on Flexible Substrates

Multifunctional Photodegradable Polymers for Reactive Micropatterns

A Facile Method of Forming Nanoscale Patterns on Poly(ethylene Glycol)-Based Surfaces by Self-Assembly of Randomly Grafted Block Copolymer Brushes.

Directed self-assembly of high-chi block copolymer for nano fabrication of bit patterned media via solvent annealing

High molecular weight block copolymer lithography for nanofabrication of hard mask and photonic nanostructures

Patterning of triblock copolymer film and its application for surface-enhanced Raman scattering

Carbon Nanopatterns and Nanoribbons from Directly Nanoimprinted Polyacrylonitrile: Correlation Between Crystallite Orientation and Nanoimprint Process

Electrostatic Crosslinking-Enabled Highly Asymmetric Lamellar Nanostructures of Polyzwitterionic Block Copolymers for Lithography.

Polyvinylpyrrolidone Hybrid Photoresist for Two-color Sensitive Direct Laser Writing

Ultra-Fast Block Copolymers for Sub-5 Nm Lithographic Patterning

Patterning of polypyrrole using protein-based template and their potential application in resist

Engineering Topochemical Polymerizations Using Block Copolymer Templates.

Directed Carbon Nanotube Assembly Using a Pyrene-Functionalized Polymer

Directed Block Copolymer Self-Assembly Implemented Via Surface-Embedded Electrets

Controllable Preparation of Block Copolymer Films with Self- Organized Patterns for the Template of Closely - Spaced Nanoparticle Array Formation

Photocatalytic Printing of Inorganic Nanopatterns Via Poly(Styrene-Block-Carbosilane) Copolymer Thin Films on Titania Substrates

The One-Pot Directed Assembly of Cylinder-Forming Block Copolymer on Adjacent Chemical Patterns for Bimodal Patterning.

Growing Embossed Nanostructures of Polymer Brushes on Wet-Etched Silicon Templated Via Block Copolymers