Influence of Surface Roughness on Elastically Backscattered Electrons

B. Da,S. F. Mao,G. H. Zhang,X. P. Wang,Z. J. Ding
DOI: https://doi.org/10.1002/sia.4807
2012-01-01
Surface and Interface Analysis
Abstract:The electron inelastic mean free path can be obtained from the elastic peak electron spectroscopy (EPES) combined with a Monte Carlo simulation. It is thus necessary to know the influence of various experimental factors on the measured and calculated results. In this work, we consider an important factor, i.e. the surface roughness or the surface topography. A Monte Carlo model, taking into account the details of the surface excitation and realistic sample surface roughness, is built to study how the surface excitation and surface roughness affect elastic peak intensity. The simulations of EPES were performed for both planar and rough Ni surfaces and for primary energies from 100 to 5000 eV. The simulation results are found to be in good agreement with the experiments; the quantitative information of elastic peak intensity influenced by surface roughness is obtained for both cylindrical mirror analyzer and retarding field analyzer. It is found that the elastically backscattered electron intensity measured by the two analyzers is only weakly influenced by surface roughness in the size range below 30 nm. The angular resolved elastic peak intensity varies with surface roughness significantly only at the large emission angles above 70o. The present simulation results then suggest that for the inelastic mean free path measurements the emission angle should be below 70o in an EPES experiment to reduce the roughness effect. Copyright © 2012 John Wiley & Sons, Ltd.
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