Liquid phase deposition (LPD) of TiO 2 thin films as photoanodes for cathodic protection of stainless steel

Caixia Lei,Han Zhou,Zude Feng,Yan Zhu,Ronggui Du
DOI: https://doi.org/10.1016/j.jallcom.2011.11.005
IF: 6.2
2012-01-01
Journal of Alloys and Compounds
Abstract:In this paper, the liquid phase deposition (LPD) technique was developed to prepare TiO 2 thin films on ITO conducting glass applied to the photogenerated cathodic protection of SUS304 stainless steel (304SS). The results showed that a dense and crack-free anatase TiO 2 film with a thickness of 800 nm was prepared from the LPD process at 80 °C for 3 h. Moreover, the TiO 2 films exhibited a decrease in crystal preferential orientation and an increase in optical band gap energy when heat treated at 300 °C and 500 °C. In addition, the results of the photoelectrochemical measurements showed that the photopotential of the as-deposited TiO 2 film was stabilized at about -200 mV, whereas those of the films subjected to heat treatment at 300 °C and 500 °C were stabilized at -400 mV and -460 mV, respectively. It was indicated that both the as-deposited and the heat treated LPD-derived TiO 2 films exhibited sufficiently negative electrode potential under illumination, which could serve as the photoanodes for effective cathodic protection of 304SS. © 2011 Elsevier B.V. All rights reserved.
What problem does this paper attempt to address?