Real-Time Monitoring the High-Aspect-Ratio Nanostructures in the Development by Using Auxiliary Structures

Huanhuan CUI,Gang LIU,Jie ZHOU,Ying XIONG,Yangchao TIAN
DOI: https://doi.org/10.3969/j.issn.1004-1699.2012.05.009
2012-01-01
Abstract:In order to monitor the height of the high-aspect-ratio nanostructures(HARNST)in the development process, the auxiliary structures are introduced on the same substrate as the nanostructures. The rectangle gratings which display a conveniently detected optical phenomenon with the variation of height, are appropriate to be the auxiliary structures. The -1st and +1st diffracted efficiency of the gratings are monitored in the development. The real-time monitoring of HARNST carried out by estimating height according to the ±1st diffracted efficiency and accurately measuring height with their ratios. The rectangle gratings with 50 lines/mm and 160 lines/mm are designed to be auxiliary structures for the monitoring of the HARNST with height up to 3 μm. The simulation results show that it is effective to monitor the height of HARNST by monitoring the diffracted efficiency of the auxiliary grating. And this method has a universal application to various nanostructures.
What problem does this paper attempt to address?