High Precision Calibration for 2-D Optical Standard

Sun Shuang-hua,Gan Xiao-chuan,Xue Zi,Ye Xiao-you,Wang He-yan,Gao Hong-tang
DOI: https://doi.org/10.1117/12.974263
2012-01-01
Abstract:Photomask is a kind of 2-D optical standard with etched orthogonal coordinates made of a glass substrate chrominged or filmed with other metal. In order to solve the problems of measurement and traceability of ultra precision photomasks used in advanced manufacturing industry, 2-D photomask optical standard was calibrated in high precision laser two coordinate standard device. A high precision differential laser interferometer system was used for a length standard, a high magnification optical micro vision system was used for precision optical positioning feedback. In this paper, a image measurement model was purposed; A sampling window auto identification algorithm was designed. Grid stripe image could be identified and aimed at automatically by this algorithm. An edge detection method based on bidirection progressive scanning and 3-sigma rule for eliminating outliers in sampling window was found. Dirty point could be removed with effect. Edge detection error could be lowered. By this means, the measurement uncertainty of 2-D optical standard's ruling span was less than 0.3 micrometer (k=2).
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