Abstract:The interferometric measurement of the transverse beam size based on synchrotron radiation is a non-intercepting high precision measurement method. Compared with the imaging method, the interferometric method can measure smaller beam size and get better resolution. It is expected to obtain submicron resolution at shorter measurement wavelength, so it is widely used in synchrotron radiation sources. The upgraded scheme of current interference device in Hefei Light Source HLS-II is presented in this paper. It is proposed to replace the first focusing lens in the original interference light path with an RC structure focusing mirror, and the second single lens with a doublet lens. The design goal of this paper is to reduce dispersion and geometric aberration without changing the optical axis of the optical path, so as to improve the imaging quality of the optical path. The geometrical optical path design is used to evaluate the imaging quality of the optical path, and physical optical simulation is performed to obtain the interference fringes of the measurement system. The simulation results show that the radius of Airy spot is reduced by about 35%, the root mean square radius of dot array is reduced by about 99%, the wavefront difference is reduced by about 75%, and the cutoff frequency of MTF function is increased by about 65%, using a focusing mirror to replace the original focusing lens can greatly improve the image quality of the optical path.

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Design and Simulation of Interferometer for Synchrotron Radiation Beam Size Measurement

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Design of an Interference System for Measuring the Transverse Beam Size in HLS-II

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Performance of Beam Size Monitor Based on Kirkpatrick–Baez Mirror at SSRF

Visible-light beam size monitors using synchrotron radiation at CESR

Development of New Beam Profile and Emittance Measurement System for HLS

Integrated optical design method for the synchrotron radiation beamlines

Research and Measurement of Synchrotron Radiation System for HLS

Development of beam profile monitor using Kirkpatrick Baez mirrors

Application of optoelectronic techniques to the measuring system for beam of light source

Optics on A Synchrotron Radiation Soft-X-Ray Microscopy Beamline and Its Dispersing Components in Hefei

Measurement of Straightness Without Abbe Error Using an Enhanced Differential Plane Mirror Interferometer