Abstract:High-accuracy calculations were performed to study the mechanisms of the reactions between the diatomic silicon monoxide (SiO) with NH3 and CH4. These reactions are relevant to the SiO-related astrochemistry and atmospheric chemistry as well as the activation of the N-H and C-H bonds by the SiO triple bond. Energetic data used in the construction of potential energy surfaces describing the SiO + NH3/CH4 reactions were obtained at the coupled-cluster theory with extrapolation to the complete basis set limit (CCSD(T)/CBS) using DFT/B3LYP/aug-cc-pVTZ optimized geometries. Standard heats of formation of a series of small Si-molecules were predicted. Insertion of SiO into the N-H bond is exothermic with a small energy barrier of ∼8 kcal/mol with respect to the SiO + NH3 reactants, whereas the C-H bond activation by SiO involves a higher energy barrier of 45 kcal/mol. Eight product channels are opened in the SiO + NH3 reaction including dehydrations giving HNSi/HSiN and dehydrogenations. These reactions are endothermic by 16-119 kcal/mol (calculated at 298.15 K) with the CCSD(T)/CBS energy barriers of 21-128 kcal/mol. The most stable set of products, HNSi + H2O, was also the product of the reaction pathway having lowest energy barrier of 21 kcal/mol. Ten product channels of the SiO + CH4 reaction including decarbonylation, dehydration, dehydrogenation, and formation of Si + CH3OH are endothermic by 19-118 kcal/mol with the energy barriers in the range of 71-126 kcal/mol. The formation of H2CSiO + H2O has the lowest energy barrier of 71 kcal/mol, whereas the most stable set of products, SiH4 + CO, is formed via a higher energy barrier of 90 kcal/mol. Accordingly, while SiO can break the N-H bond of ammonia without the assistance of other molecules, it is not able to break the C-H bond of methane.

Reaction of Silicon Dioxide with Water: A Matrix Isolation Infrared and Density Functional Theoretical Study

Reactions of silicon dioxide with ammonia molecules: formation and characterization of the SiO2–NH3 complex and the H2NSiOOH molecule

Reactions of Titanium Oxides with Water Molecules. A Matrix Isolation FTIR and Density Functional Study

Oxidation Mechanism Of Si(111)-7 X 7 By Water: A Theoretical Study

Initial Oxidation of 3C-Sic (111) in Oxidizing Atmosphere Containing Water Vapor: H2O Adsorption from First-Principles Calculations

An ONIOM Study of H2O Interacting with the C-terminated Surface of Silicon Carbide

Surface Orientation and Temperature Effects on the Interaction of Silicon with Water: Molecular Dynamics Simulations Using ReaxFF Reactive Force Field.

Reactivity of H2O and the Si-terminated Surface of Silicon Carbide Studied with ONIOM Method

Study on the Mechanism of Water Absorption of SiOC Low-κ Dielectrics

Matrix Isolation Infrared Spectroscopic and Theoretical Study of the Hydrolysis of Boron Dioxide in Solid Argon

Reactions of Group IV Metal Atoms with Water Molecules. Matrix Isolation FTIR and Theoretical Studies

Reaction of water with hydrofluoric acid treated silicon(111) and (100) surfaces

Stress-driven oxidation chemistry of wet silicon surfaces

Matrix Isolation FTIR Spectroscopic and Density Functional Theoretical Studies of the O2SiCO and O2Si(CO)2 Molecules

Hydroxylation of Metal-Supported Sheet-Like Silica Films

Description of Si and Al Release from Aluminosilicate in the Acidic Condition Using Density Functional Theory: Protonated Terminal Oxygen

Matrix Isolation Spectroscopic and Theoretical Study of Water Adsorption and Hydrolysis on Molecular Tantalum and Niobium Oxides

Reactions of Silicon Atoms with NO. Experimental and Theoretical Characterization of Molecules Containing Si, N, and O

Oxidation Behaviors of C/SiC in the Oxidizing Environments Containing Water Vapor

H2o And O-2 Co-Adsorption On 3c-Sic (111) By First-Principle Calculations: The Role Of Water In Initial Oxidation

Theoretical Study of Silicon Monoxide Reactions with Ammonia and Methane