Plasma nitriding in low pressure in an ECR microwave plasma

Ru-Juan Zhan,Cu Wang,Xiaohui Wen,Xiaoding Zhu
DOI: https://doi.org/10.1016/S0257-8972(98)00468-X
1998-01-01
Abstract:Pure iron and 38CrMoAl samples have been plasma-nitrided by using electron cyclotron resonance (ECR)-microwave (2.45 GKz) N-2-H-2 discharge plasmas at low pressures (4-8 x 10(-2) Pa) and at a temperature of 500 degrees C. The experiment results show that both phases of gamma'- and epsilon-iron nitrides are formed on the surface of the nitrided samples. The thickness of the compound layer depends on the plasma nitriding time. After 4 h of nitriding, a 5-6-mu m iron nitride layer and 200 mu m diffusion layer are formed. The surface microhardness of the nitrided sample is increased. (C) 1998 Elsevier Science S.A.
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