Microstructure Development of Mechanical-Deformation-Induced Sn Whiskers

Shih-Kang Lin,Yuhi Yorikado,Junxiang Jiang,Keun-Soo Kim,Katsuaki Suganuma,Sinn-Wen Chen,Masanobu Tsujimoto,Isamu Yanada
DOI: https://doi.org/10.1007/s11664-007-0284-4
IF: 2.1
2007-01-01
Journal of Electronic Materials
Abstract:The development of the microstructure of mechanical-deformation-induced Sn whiskers on electroplated films has been examined using a focused ion beam system (FIB). The 6- μ m-thick matte Sn films were compressed by using a ZrO 2 ball indenter under ambient conditions. After compression, tin whiskers and small nodules were found adjacent to, and several grains further away from, the indents. The cross-sectional microstructures of the indents and whiskers indicate that the lateral boundaries of the newly created grains caused by recrystallization are the main routes for stress relaxation.
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