Preparation of High-Density TiO2 Nanodots on Si Substrate by a Novel Method

Ming Luo,Kui Cheng,Wenjian Weng,Chenlu Song,Piyi Du,Ge Shen,Gang Xu,Gaorong Han
DOI: https://doi.org/10.1016/j.matlet.2007.10.052
IF: 3
2008-01-01
Materials Letters
Abstract:TiO2 nanodots can hopefully be used as optical devices, high performance sensor and highly active catalyst. The preparation of TiO2 nanodots with small dot size and high dot density on substrates becomes increasingly significant since small dot size can guarantee quantum effects and high activity, while high dot density can provide a basis for miniaturizing devices and increasing performance capacity. In this letter, high density TiO2 nanodots on Si substrate were prepared by a "microscopic mass-point addition" method. SEM images and XPS profiles revealed that pure TiO2 nanodots with high density (similar to 5x10(11) cm(-2)) could be fabricated on Si substrate and the average dot size could be adjusted (8 nm similar to 11.5 nm) by temperature control of the substrate. it is suggested that the prepared high density TiO2 nanodots have great potential applications in fabrication of related devices. (c) 2007 Elsevier B.V. All rights reserved.
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