Lithography Alignment Technology Based on Two-Dimensional Zero Reference Grating by Transmission-Reflection

YE Xi-biao,ZHOU Cheng-gang,ZHANG Yang,HUANG Wen-hao
DOI: https://doi.org/10.3969/j.issn.0253-2778.2007.03.009
2007-01-01
Journal of University of Science and Technology of China
Abstract:A two-dimensional zero reference grating by transmission-reflection based on the theory of two-dimensional zero reference grating was proposed.Its feasibility was analyzed in theory and its alignment capability was verified in experiments.The data obtained from the experiments demonstrate that the two-dimensional zero reference grating by transmission-reflection provides better contrast and distinguishing zero point capability than does the normal lithography alignment technology.As a new alignment technology between mask and silicon wafer,the technology can offer a better than 20 nm alignment precision repeat used in lithography systems.
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