The Third- And Fifth-Order Nonlinear Refraction In The Single- And Double-Sided Tmaf/Pss Electrostatic Self-Assembly Films

Qiuyun Ouyang,Xueru Zhang,Yinclin Song
DOI: https://doi.org/10.1142/S0218863508004366
2008-01-01
Journal of Nonlinear Optical Physics & Materials
Abstract:The nonlinear refraction in the single- and double-sided 40-bilayer TMAF/PSS electrostatic self-assembly films were measured by closed-aperture Z-scan technique with picosecond laser pulses (with duration of 40 ps at 532 nm). The materials contain a positively charged material trifluoroacetic acid (TFA) salt of amino-substitute methanofullerene derivative monoadduct fullerene (TMAF) and a negatively charged material ploy (sodium 4-styrenesulfon ate) (PSS). The experimental results show that under the conditions of the peak intensity I-0 = 7.0 GW/cm(2), both the single- and double-sided films demonstrate third- and fifth-order non-linearities, and the fifth-order non-linearity has greater contribution to the nonlinear refraction than the third- order nonlinearity. The theoretical fittings also prove that the nonlinear refraction coefficients both gamma and eta are almost the same for the same materials no matter what the measurements are from the single- or the double-sided films.
What problem does this paper attempt to address?