A Method for Describing and Monitoring Process States in IC Fabrication

JU Li-jie,YAN Li-ren
DOI: https://doi.org/10.3969/j.issn.1004-3365.2006.04.008
2006-01-01
Abstract:One way to construct a process state space is to compose a set of generalized parameters from orthogonalizing the PCM parameters,and use them as the bases of the space.With our method,not only the possible process failures can be detected,but also the process state can be long term monitored.In the process state space,the data distribution appears like a multi-dimension elliptical globe.So,the transition of a process can be monitored by tracing the transmutations of the elliptical globe. A formula is suggested to calculate the process state similarity.Further,if a process failure occurs,the cause can be directly pointed out.
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