Ge quantum-dot polysilicon emitter heterojunction phototransistors for 1.31–1.55μm light detection

Rongshan Wei,Ning Deng,Hao Dong,Min Ren,Lei Zhang,Peiyi Chen,Litian Liu
DOI: https://doi.org/10.1016/j.mseb.2007.08.005
2008-01-01
Abstract:A Si/SiGe HBT-type phototransistor with 10Ge-dot layers (8ML in each layer, separated by 30nm Si spacer) incorporated in the base-collector junction was grown by UHV-CVD. To achieve low dark current density and high photo-responsivity, a high-low emitter profile consisting of a heavily doped polysilicon contact on top of a thin epitaxial emitter cap has been fabricated. At room temperature, I–V measurement showed a low dark current density of 3×10−5A/cm2 at 3V. The measured breakdown voltage BVceo was about 12V. A photo-responsivity of 1.94 and 0.028mA/W was achieved at 1.31 and 1.55μm for normal incidence, respectively. Compared to a p–i–n reference detector with the same quantum-dot layer, the responsivity is improved by a factor of 45 and 20 at 1.31 and 1.55μm, respectively.
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