Growth and Surface Morphology of Nano-TiO2 Films

Fanming Meng,Mingfei Zhou,Qi Cai,Zhaoqi Sun

DOI: https://doi.org/10.13922/j.cnki.cjovst.2008.01.012

2008-01-01

Abstract:Surface morphology of TiO2 films,grown by RF magnetron sputtering on Si substrate and annealed at different temperatures,were characterized with X-ray diffraction(XRD),atomic force microscopy(AFM) and X-ray photoelectron spectroscopy(XPS).The results show that the annealing temperature significantly affects its microstructures.For instance,annealed below 400 ℃,the film is amorphous;however,at annealing temperatures of 400 ℃ or 600 ℃,anatase and rutile comes into being,respectively.At an annealing temperature higher than 1000 ℃,anatase phase turns into rutile phase completely.As annealing temperature rises up from 400 ℃ to 1000 ℃,the grain size grows and the surface roughens,but turning around at 1000 ℃ abruptly,possibly because of the phase transition.