N-Type Doping of an Electron-Transport Material by Controlled Gas-Phase Incorporation of Cobaltocene

Calvin K. Chan,Fabrice Amy,Qing Zhang,Stephen Barlow,Seth Marder,Antoine Kahn
DOI: https://doi.org/10.1016/j.cplett.2006.09.034
IF: 2.719
2006-01-01
Chemical Physics Letters
Abstract:N-doping of an electron-transport material, a tris(thieno)hexaazatriphenylene derivative (1), with the strongly reducing molecule bis(cyclopentadienyl)-cobalt(II) (cobaltocene, CoCp2), is investigated using ultra-violet, X-ray, and inverse photoemission spectroscopies, and current–voltage measurements. Condensed CoCp2 films show a 4eV ionization energy, which is unusually low for vacuum-deposited molecular material and suggests that cobaltocene is promising as a molecular n-dopant. Efficient n-doping of 1 by CoCp2 is confirmed by a 0.56eV shift of the Fermi level toward the unoccupied states of the host, and by a three orders of magnitude current increase in devices where compound 1 is interfacially doped with cobaltocene.
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