Oxidation Behavior of NBD 200 Silicon Nitride Ceramics

P Mukundhan,JQ Wu,HH Du
DOI: https://doi.org/10.1111/j.1151-2916.1999.tb02074.x
IF: 4.186
1999-01-01
Journal of the American Ceramic Society
Abstract:The oxidation behavior of NBD 200 Si3N4 containing 1 wt% MgO sintering aid was investigated in oxygen at 900°‐1300°C. The oxide growth followed a parabolic rate law with an apparent activation energy of 260 kJ/mol. The oxide layers were enriched with sodium and magnesium because of outward diffusion of intergranular Na+ and Mg2+ cations in the ceramics. The 2‐4 orders of magnitude higher oxidation rate for NBD 200 Si3N4 than for other Si3N4 ceramics with a similar amount of MgO could be attributed to the presence of sodium. The oxidation process was most likely rate limited by grain‐boundary diffusion of Mg2+.
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