Abstract:The ZrN film has drawn wide attentions as a protective material due to its attractive properties. In this study, ZrN films having thickness about 45 nm were prepared by dual ion beam sputtering deposition to investigate the influence of assisted ion beam (300 eV/25 mA similar to 800 eV/60 mA) and deposition temperature (unheated similar to 600 degrees C) on nano-film microstructure, grain size, density, and Young's modulus. A double layer structure, comprising an amorphous layer closed to the substrate and a crystalline layer above the amorphous layer was observed. The amorphous layer thickness decreases with the increase of atom mobility and the decrease of oxygen concentration. The assisted ion beam flux and energy influence the grain size, density, and Young's modulus. A porous structure and rough surface forms under high flux and energy assisted ion beam due to the severe damage and resputtering under high-energy nitrogen ion. Besides this, thickness of the amorphous layer decreases, increasing the grain size, density, and Young modulus due to deposition temperature. The Young's modulus shows some dispersion in the low (111) texture coefficient region indicates excellent linearity with the grain size and density. The Young modulus of nanofilm is strongly influenced by grain size or density. The nanofilm texture shows negligible impact on thin film Youngs Modulus.

Influence of Deposited Pressure on Refractive Index and Packing Density of ZrO2 Coatings by Electron Beam Evaporation

Roughness and Light Scattering Properties of ZrO 2 Thin Films Deposited by Electron Beam Evaporation

The Effects of Oxygen Partial Pressure and Substrate Temperature on the Structural and Optical Properties of Zno Films

Influence of O2 Partial Pressure on the Micro-structure of ZrO2 Thin Films by Electron Beam Evaporation

Laser-induced damage threshold of ZrO2 thin films prepared at different oxygen partial pressures by electron-beam evaporation

The effect of thickness and film homogeneity on the optical and microstructures of the ZrO2 thin films prepared by electron beam evaporation method

Structure related optical properties of electron beam evaporated ZrO2:10%SiO2 thin films

Structural and Optical Characterizations of ZnO Films Grown by Reactive Electron Beam Evaporation

Influence of Working Pressure on the Crystallinity and Growth Behavior of ZnO Films Deposited by Reactive Radio-Frequency Magnetron Sputtering

The effect of deposition conditions on structure properties of radio frequency reactive sputtered polycrystalline ZnO films

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Growth of TiO2/ZrO2 composite films and its refractive index

Thickness-dependent structural and optical properties of sputter deposited ZrO2 films

Influence of the deposition energy on the composition and thermal cycling behavior of La2(Zr0.7Ce0.3)2O7 coatings

INFLUENCE OF ARGON PRESSURE ON MICROSTRUCTURE AND OPTICAL PROPERTIES OF Zn0.9Se:Co-0.1 THIN FILMS PREPARED BY PULSED LASER DEPOSITION

Microstructure and Young's Modulus of ZrN Thin Film Prepared by Dual Ion Beam Sputtering Deposition

Microstructure and Ablation Behavior of Very Low-Pressure Plasma Sprayed ZrB2-Based Coatings

Microstructure and micro-mechanical properties of zirconia coating by atmospheric pressure chemical vapor deposition

Refractive index of thin films of SiO2, ZrO2, and HfO2 as a function of the films' mass density

Influence of Low Sputtering Pressure on Structural, Electrical and Optical Properties of Al-Doped Zinc Oxide Thin Films

Compositions of Deposited Films Using Ion Beam Sputtering Zr with Reactive Oxygen