Abstract:The chemical binding of pyrrolidine on Si(111)-7 x 7 was studied using high-resolution electron energy loss spectroscopy (HREELS), X-ray photoelectron spectroscopy (XPS), and DFT calculation, to obtain a thorough mechanistic understanding of the formation of dative bonds of nitrogen-containing organic molecules on semiconductor surfaces. This study focuses on the electronic and geometric structures of the surface reactive sites. XPS of a chemisorbed monolayer suggests two adsorbates (beta 1 and beta 2) associated with the formation of a N center dot center dot center dot Si-ad dative bond. At low exposure, the adsorbate beta 1 forms a dative bond as indicated by a higher N1s binding energy compared to the Si-N sigma bond in the dissociated product formed at 250 K. At higher exposure, the formation of the second N center dot center dot center dot Si-ad dative bond in adsorbate beta 2 was evidenced by an obvious upshift of the N1s core-level in contrast to that observed for physisorbed molecules or Si-N sigma-bonded molecules. Vibrational studies show a down-shift of the N-H stretching frequency by similar to 95 cm(-1) upon the formation of the N center dot center dot center dot Si-ad dative bond in contrast to the free pyrrolidine molecule, providing new evidence for the dative bonding between amines and silicon surfaces. These studies suggest that the beta 2 state is an adsorbate directly bonded to the silicon surface adatom via the formation of a N center dot center dot center dot Si-ad dative bond, and the beta 1 state is an adsorbate which forms a N center dot center dot center dot Si-ad dative bond with an adatom and a weak N-H center dot center dot center dot Si-re hydrogen bond with an adjacent electron-rich rest atom. In the beta 1 adsorbate, both electron acceptance by the adatom and electron donation by the rest atom occur simultaneously with one pyrrolidine molecule through dative bonding and hydrogen bonding, respectively. The extra electron-deficient adatom sites on Si(111)-7 x 7 provide an opportunity for forming a second dative bond after the formation of the first in contrast to Ge(100) and Si(100) where the number of electron-deficient and electron-rich sites are equivalent. The difference in electronic and geometric structures of the reactive sites on different semiconductor surfaces offers a useful channel to shape reactivity and selectivity of organic functional groups on silicon surfaces.

Diethylsilane Decomposition on Silicon Surfaces Studied Using Transmission Ftir Spectroscopy

Revisiting the vibrational spectra of silicon hydrides on Si(100)-(2x1) surface: What is on the surface when disilane dissociates?

Surface Orientation and Temperature Effects on the Interaction of Silicon with Water: Molecular Dynamics Simulations Using ReaxFF Reactive Force Field.

Adsorption and Decomposition of 1,3-Disilabutane on Si (111)-7×7

Dissociative Adsorption of Methylsilane on the Si(100)-2 × 1 Surface

Effects of Ethylene doping on Deposition Rate and Surface Profile of Silicon Films

Impacts of surface morphology on ion desorption and ionization in desorption ionization on porous silicon (DIOS) mass spectrometry

The Lateral and Longitudinal Etching Rates of Silicon and Silica on Si(100) Surface

Surface Topography and Character of Γ-Aminopropyltriethoxysilane and Dodecyltrimethoxysilane Films Adsorbed on the Silicon Dioxide Substrate Via Vapour Phase Deposition

Kinetics of Silane Decomposition in High-Pressure Confined Chemical Vapor Deposition of Hydrogenated Amorphous Silicon

Mechanism of the silane decomposition. I. Silane loss kinetics and rate inhibition by hydrogen. II. Modeling of the silane decomposition (all stages of reaction)

Boundary layer chemistry probed by in situ infrared spectroscopy during SiO2 deposition at atmospheric pressure from tetraethylorthosilicate and ozone

A direct pathway for sticking/desorption of H$_2$ on Si(100)

Unraveling Combustion Chemistry of Dimethyldiethoxysilane. I. A Comprehensive Pyrolysis Investigation with Insight into Ethanol Formation Mechanism in Combustion of Ethoxysilane Flame Synthesis Precursors

Studies of the Surface Wettability and Hydrothermal Stability of Methyl-Modified Silica Films by FT-IR and Raman Spectra

Thermal Stability of Organic Monolayers Grafted to Si(111): Insights from ReaxFF Reactive Molecular Dynamics Simulations.

Transfer of Electron Density and Formation of Dative Bonds in Chemisorption of Pyrrolidine on Si(111)-7 × 7

First-Principles Study of the Effect of Surface Heteroatoms on Silane Dissociation

THE THERMAL DESORPTION SPECTRA STUDY OF HYDROGEN CHEMISORPTION ON Si(100) CLEAN SURFACE

Interaction of tetraethoxysilane with OH-terminated SiO 2 (0 0 1) surface: A first principles study

Interaction Of Tetraethoxysilane With Oh-Terminated Sio2 (001) Surface: A First Principles Study