Effects of current density and temperature on Sn/Ni interfacial reactions under current stressing

Chao-Hong Wang,Chun-yi Kuo,Hsien-hsin Chen,Sinn-wen Chen
DOI: https://doi.org/10.1016/j.intermet.2010.09.010
IF: 4.075
2011-01-01
Intermetallics
Abstract:This research studied the electromigration effects on Sn/Ni/Sn sandwich-type couple interfacial reactions with various electric current densities at different temperatures. The Sn/Ni cathode side is always formed with a uniform Ni3Sn4 layer. At the opposite Ni/Sn anode interface either Ni3Sn4 or NiSn4 could form, which depends on the reaction temperatures and current densities. The results reveal that with a current density of 1000A/cm2 at 180°C, the Ni3Sn4 phase remains layer-structured. As the applied current exceeds 2000A/cm2, Ni atoms are driven by electromigration force to migrate into the Sn matrix to form the irregular bulk Ni3Sn4 and NiSn4. With a higher current density of 5000A/cm2, large amounts of the Ni3Sn4 phase are distributed into the Sn matrix and even the Ni substrate is seriously consumed. At lower temperatures, below 150°C and with 5000A/cm2 current, the plate-like metastable NiSn4 phase is found in the Sn matrix at the anode side. In this electromigration study on the Sn/Ni interfacial reactions, both the reaction temperatures and the applied current densities greatly affect the reaction phase species and their morphologies.
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