Fabrication of Grating Waveguide Using Photopolymerization

Yao Shu-shan,Qin Xiao-yan,Yu Xiao-qiang,Zhang Qi,Xu Guang-hu,Wang Ze-yan,Dong Yi,Jing Xiang-yang,Sun Yu-ming,Huang Bai-biao
DOI: https://doi.org/10.1016/s1003-6326(06)60149-0
IF: 3.752
2006-01-01
Transactions of Nonferrous Metals Society of China
Abstract:Two ternary materials systems, which comprise photoinitiator/two-photon initiators, oligomer and binder were prepared. Polymeric waveguide film was manufactured by spinning the materials on optical glass (refraction index=1.5), the two-photon initiated photopolymerization (TPIP) and single-photon holographic photopolymerization were carried out respectively in the polymer wave guide film. The preparation of these materials was explained and absorption spectra were tested. The experimental results including the micrographs and diffraction patterns verifying the formation of grating waveguide structures were given. The results show that grating waveguide microstructures can be holographically fabricated by single-photon photopolymerization with low-power (tens mW) continuous-wave (CW) laser at 532 nm successfully. Because the continuous-wave laser at 532 nm is handier than one at 514 nm.
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