Abstract:HiPIMS plasmas generate energetic metal ions at the substrate as a major difference to conventional direct current magnetron sputtering. The origin of these ions is still an open issue, which is unraveled by using two fast diagnostics: time resolved mass spectrometry with a temporal resolution of 2 $\mu$s and phase resolved optical emission spectroscopy with a temporal resolution of 1 $\mu$s. A power scan from dcMS-like to HiPIMS plasmas was performed, with a 2-inch magnetron and a titanium target as sputter source and argon as working gas. Clear differences in the transport as well in the energetic properties of Ar$^{+}$, Ar$^{2+}$, Ti$^+$ and Ti$^{2+}$ were observed. For discharges with highest peak power densities a high energetic group of Ti$^+$ and Ti$^{2+}$ could be identified. A cold group of ions is always present. It is found that hot ions are observed only, when the plasma enters the spokes regime, which can be monitored by oscillations in the IV-characteristics in the MHz range that are picked up by the used VI-probes. These oscillations are correlated with the spokes phenomenon and are explained as an amplification of the Hall current inside the spokes as hot ionization zones. To explain the presence of energetic ions, we propose a double layer (DL) confining the hot plasma inside a spoke: if an atom becomes ionized inside the spokes region it is accelerated because of the DL to higher energies whereas its energy remains unchanged if it is ionized outside. In applying this DL model to our measurements the observed phenomena as well as several measurements from other groups can be explained. Only if spokes and a double layer are present the confined particles can gain enough energy to leave the magnetic trap. We conclude from our findings that the spoke phenomenon represents the essence of HiPIMS plasmas, explaining their good performance for material synthesis applications.

On Time-of-flight Ion Energy Deposition into a Metal Target by High-Intensity Pulsed Ion Beam Generated in Bipolar-Pulse Mode

Dynamic Energy Spectrum and Energy Deposition in Solid Target by Intense Pulsed Ion Beams

Study of energy deposition of intense pulsed ion beam in metal target

Distribution and Evolution of Thermal Field Induced by Intense Pulsed Ion B Eam on Thin Metal Target

Two-dimension Numerical Research on the Ablation of Target Irradiated by Intense Pulsed Ion Beam

Distribution and evolution of thermal field formed by intense pulsed ion beam on thin metal target

The thermodynamical process in metal surface due to the irradiation of intense pulsed ion beam

Model of Intense Pulsed Ion Beam and Simulation Study of Energy Deposited on Target

Mechanism of Craters Formed on Ti Surface Irradiated by High Intensity Pulsed Ion Beams

Numerical Study on Interaction of High Intense Pulsed Ion Beam and Ti Target

Study of Intense Pulsed Energy Effects for High Power Pulsed Ionbeam Implantation

Two-Dimensional Numerical Research on Effects of Titanium Target Bombarded by Temp Ii Accelerator

Computer simulation of thermal–mechanical effects of high intensity pulsed ion beams on a metal surface

Ablation Induced by Intense Pulsed Ion Beam and Its Effects on Energy Deposition on Solid Target

Simulation of Energy Absorbed by Target with Intense Pulsed Ion Beam Model

Origin of the energetic ions at the substrate generated during high power pulsed magnetron sputtering of titanium

Numerical Simulation on the Energy Deposition of Double-Layer Target Irradiated by Intense Pulsed Ion Beam

Shielding of Energy Deposition by Ablation of Plastics under Intense Pulsed Ion Beam Irradiation

Numerical Study of Dynamic Effects and Evaporation of Target Material under Irradiation of Intense Pulsed Ion Beam

Numerical study on the evolution of temperature of double-layer target irradiated by high power ion beam

Bipolar high power impulse magnetron sputtering for energetic ion bombardment during TiN thin film growth without the use of a substrate bias